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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Barc Etch: Difference between revisions

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===Sample===
===Sample===
*6" Si
*6" Si
* 2µm SiO2 from C1
* 2 µm SiO2 from C1
*90nm barc
*90 nm barc
*907 nm UVN 2030-0,5
*907 nm UVN 2030-0,5
*Reticle: Pegreticle
*Reticle: Pegreticle