Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal: Difference between revisions
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! Parameter | ! Parameter | ||
|Recipe name: ''' | |Recipe name: '''Al2O3 Etch''' | ||
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|Coil Power [W] | |Coil Power [W] | ||
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<br clear="all" /> | <br clear="all" /> | ||
==Al2O3 etching by sanvis@nanolab | ==Al2O3 etching by Sanjeev Vishal Kota sanvis@nanolab== | ||
[[Media:Alumina etch information.pptx| | *[[Media:Alumina etch information.pptx|Presentation made by Sanvis @DTU Nanolab, click to view]] | ||
{| border="1" cellspacing="2" cellpadding="2" | {| border="1" cellspacing="2" cellpadding="2" | ||
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|Etch rate | |Etch rate | ||
|'''6.25 nm/min on 6" wafer''', ''Summer sanvis@nanolab'' | |'''6.25 nm/min on 6" wafer''', ''Summer sanvis@nanolab'' | ||
|'''25 nm/min on small samples on Si carrier''', ''Summer sanvis@nanolab'' | |'''25 nm/min on small samples on Si carrier''', ''Summer 2022 sanvis@nanolab'' | ||
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===Results=== | ===Results=== | ||
<gallery caption="Profile view" widths="400px" heights="325px" perrow="3"> | <gallery caption="Profile view, etch time 40 min, started with 380 nm zep resist" widths="400px" heights="325px" perrow="3"> | ||
Image:S038116_01.jpg | Image:S038116_01.jpg | ||