Specific Process Knowledge/Lithography/Coaters/GammaDUV: Difference between revisions
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==Spin coater: Süss stepper== | ==Spin coater: Süss stepper== | ||
[[Image:Gamma_2M.jpg| | [[Image:Gamma_2M.jpg|400px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3]] | ||
This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. | This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. | ||
The user manual, quality control procedures and results, user APVs, and contact information can be found in LabManager: | |||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=279 LabManager] | |||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=279 LabManager] - '''requires login''' | |||
{{:Specific Process Knowledge/Lithography/Resist/DUVresist}} | {{:Specific Process Knowledge/Lithography/Resist/DUVresist}} | ||
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===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||