Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
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Added info about cleaning non standard size samples |
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'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA click here]''' | '''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA click here]''' | ||
'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.''' | '''All links to Kemibrug (SDS) and Labmanager Including APV requires login.''' | ||
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You can find the APV for the RCA bench [http://labmanager.dtu.dk/d4Show.php?id=1916&mach=243 here] | You can find the APV for the RCA bench [http://labmanager.dtu.dk/d4Show.php?id=1916&mach=243 here] | ||
===RCA procedure=== | === RCA procedure === | ||
*'''RCA1: 10 min''' | *'''RCA1: 10 min''' | ||
*DI water rinsing (dumping three times) | *DI water rinsing (dumping three times) | ||
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For procedure details please look in the [http://labmanager.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | For procedure details please look in the [http://labmanager.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | ||
=== RCA Cleaning of non-standard sample size === | |||
There are different possibilities in the RCA bench and in beakers in the fumehood. Please contact Nanolab staff in this situation. | |||
'''The user manual, user APV and contact information can be found in LabManager:''' | '''The user manual, user APV and contact information can be found in LabManager:''' | ||