Jump to content

Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

Bghe (talk | contribs)
Mmat (talk | contribs)
mNo edit summary
 
(5 intermediate revisions by 3 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]'''
{{cc-nanolab}}


[[Category: Equipment|Thin film PECVD]]
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>
[[Category: Thin Film Deposition|PECVD]]
 
''This page is written by DTU Nanlab internal''
[[Category:Equipment|Thin film PECVD]]
[[Category:Thin Film Deposition|PECVD]]


==PECVD Plasma Enhanced Chemical Vapor Deposition==
==PECVD Plasma Enhanced Chemical Vapor Deposition==
Line 29: Line 30:
*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]]
*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]]


*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br />
 
 
 
 
 
 
<br clear="all" />
 
==Overview of the performance of PECVD thin films and some process related parameters==
==Overview of the performance of PECVD thin films and some process related parameters==


Line 64: Line 56:
|style="background:LightGrey; color:black"|Film thickness
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*~10nm - 30µm
*~10nm - 30µm (recipe dependant)
|
|
*~10nm - 30µm
*~10nm - 30µm (recipe dependant)
|-
|-
|style="background:LightGrey; color:black"|Index of refraction
|style="background:LightGrey; color:black"|Index of refraction
Line 105: Line 97:
|style="background:LightGrey; color:black"|Gas flows
|style="background:LightGrey; color:black"|Gas flows
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*SiH<sub>4</sub>:0-60 sccm
*SiH<sub>4</sub>:0-180 sccm
*N<sub>2</sub>O:0-3000 sccm
*N<sub>2</sub>O:0-3000 sccm
*NH<sub>3</sub>:0-1000 sccm
*NH<sub>3</sub>:0-1000 sccm