Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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[[Category: Equipment|Thin film PECVD]] | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | ||
[[Category: Thin Film Deposition|PECVD]] | |||
[[Category:Equipment|Thin film PECVD]] | |||
[[Category:Thin Film Deposition|PECVD]] | |||
==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||
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*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | *[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br /> | ||
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==Overview of the performance of PECVD thin films and some process related parameters== | ==Overview of the performance of PECVD thin films and some process related parameters== | ||
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|style="background:LightGrey; color:black"|Film thickness | |style="background:LightGrey; color:black"|Film thickness | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~10nm - 30µm | *~10nm - 30µm (recipe dependant) | ||
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*~10nm - 30µm | *~10nm - 30µm (recipe dependant) | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Index of refraction | |style="background:LightGrey; color:black"|Index of refraction | ||
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*SiH<sub>4</sub>:0- | *SiH<sub>4</sub>:0-180 sccm | ||
*N<sub>2</sub>O:0-3000 sccm | *N<sub>2</sub>O:0-3000 sccm | ||
*NH<sub>3</sub>:0-1000 sccm | *NH<sub>3</sub>:0-1000 sccm | ||