Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||
Name PECVD4: PRO CVD <br> | Name PECVD4: PRO CVD <br> | ||
Vendor: SPTS <br> | Vendor: SPTS <br> | ||
[[image:PECVD3a.jpg|300x300px|right|thumb|PECVD3 - positioned in cleanroom A-1]] | [[image:PECVD3a.jpg|300x300px|right|thumb|PECVD3 - positioned in cleanroom A-1, photo: DTU Nanolab internal]] | ||
[[image:PECVD4.JPG|300x300px|right|thumb|PECVD4 - positioned in cleanroom B-1]] | [[image:PECVD4.JPG|300x300px|right|thumb|PECVD4 - positioned in cleanroom B-1, photo: DTU Nanolab internal]] | ||
We have two PECVD's here at DTU Nanolab. They can both be used to deposit Silicon oxides and Silicon nitrides with or without dopants of Boron and Phosphorus. PECVD3 can also deposit thin layer of aSi. PECVD3 is used for silicon based processing with small amounts (<5% wafer coverage, under some condition even more) of metals where as PECVD4 is dedicated for clean wafers both for silicon based materials and III-V materials. Quartz carriers are used in PECVD4 and they are dedicated the two different material groups to avoid cross contamination. See the precise rules in the equipment manuals which are uploaded in LabManager. | We have two PECVD's here at DTU Nanolab. They can both be used to deposit Silicon oxides and Silicon nitrides with or without dopants of Boron and Phosphorus. PECVD3 can also deposit thin layer of aSi. PECVD3 is used for silicon based processing with small amounts (<5% wafer coverage, under some condition even more) of metals where as PECVD4 is dedicated for clean wafers both for silicon based materials and III-V materials. Quartz carriers are used in PECVD4 and they are dedicated the two different material groups to avoid cross contamination. See the precise rules in the equipment manuals which are uploaded in LabManager. | ||
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*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | *[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br /> | ||
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==Overview of the performance of PECVD thin films and some process related parameters== | ==Overview of the performance of PECVD thin films and some process related parameters== | ||
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|style="background:LightGrey; color:black"|Film thickness | |style="background:LightGrey; color:black"|Film thickness | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~10nm - 30µm | *~10nm - 30µm (recipe dependant) | ||
| | | | ||
*~10nm - 30µm | *~10nm - 30µm (recipe dependant) | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Index of refraction | |style="background:LightGrey; color:black"|Index of refraction | ||
| Line 105: | Line 95: | ||
|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*SiH<sub>4</sub>:0- | *SiH<sub>4</sub>:0-180 sccm | ||
*N<sub>2</sub>O:0-3000 sccm | *N<sub>2</sub>O:0-3000 sccm | ||
*NH<sub>3</sub>:0-1000 sccm | *NH<sub>3</sub>:0-1000 sccm | ||
*N<sub>2</sub>:0-3000 sccm | *N<sub>2</sub>:0-3000 sccm | ||
*5%PH<sub>3</sub>:0-60 sccm | *5%PH<sub>3</sub>:0-60 sccm | ||
*3%B<sub>2</sub>H<sub>6</sub>:0- | *3%B<sub>2</sub>H<sub>6</sub>:0-200 sccm | ||
| | | | ||
*SiH<sub>4</sub>:0-60 sccm | *SiH<sub>4</sub>:0-60 sccm | ||
*N<sub>2</sub>O:0-3000 sccm | *N<sub>2</sub>O:0-3000 sccm | ||
*NH<sub>3</sub>:0- | *NH<sub>3</sub>:0-287 sccm | ||
*N<sub>2</sub>:0-3000 sccm | *N<sub>2</sub>:0-3000 sccm | ||
*Ar:0- | *Ar:0-1415 sccm | ||
*5%PH<sub>3</sub>:0-100 sccm | *5%PH<sub>3</sub>:0-100 sccm | ||
*3%B<sub>2</sub>H<sub>6</sub>:0- | *3%B<sub>2</sub>H<sub>6</sub>:0-270 sccm | ||
|- | |- | ||
!style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates | !style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates | ||