Specific Process Knowledge/Lithography/Resist: Difference between revisions
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'''Feedback to this page''': '''[mailto: | {{cc-nanolab}} | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist click here]''' | |||
[[Category: Lithography|Resist]] | [[Category: Lithography|Resist]] | ||
{{:Specific Process Knowledge/Lithography/Resist/UserBottles}} | |||
=UV Resist= | =UV Resist= | ||
Standard UV sensitive resists available at DTU Nanolab: | |||
*[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] | |||
*[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] | |||
*[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] | |||
*[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]] | |||
*[[Specific_Process_Knowledge/Lithography/SU-8|SU-8]] (2005, 2035, and 2075) | |||
*[[Specific_Process_Knowledge/Lithography/TIspray|TI Spray]] | |||
{{:Specific Process Knowledge/Lithography/Resist/UVresist}} | {{:Specific Process Knowledge/Lithography/Resist/UVresist}} | ||