Specific Process Knowledge/Lithography/Resist/DUVresist: Difference between revisions

Latest revision as of 13:04, 2 February 2023

DUV resist overview

The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.

Bottom Anti Reflection Coating (BARC):

Manufacturers website: DUV 42S-6
Datasheet: DUV42S-6 - requires login

Positive DUV resist for spin coating in 600-300nm thickness range:

Manufacturers website: KrF M230Y
Datasheet: KrF M230Y - requires login

Positive DUV resist for spin coating in 1600-800nm thickness range:

Manufacturers website: KrF M35G
Datasheet: KrF M35G - requires login

Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range:

Manufacturers website: UVN2300-0.8
Datasheet: UVN2300-0.8 - requires login

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-'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/DUVresist click here]'''
+===DUV resist overview===
+The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.
+'''Bottom Anti Reflection Coating (BARC):'''
+*Manufacturers website: [http://www.brewerscience.com/products/arc/dry-etch-arc-coatings/248nm-products/duv42s DUV 42S-6]
+*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=Datasheet+DUV42S.pdf DUV42S-6] - '''requires login'''
-==DUV resist==
-The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.
-Information about resist can be found here:
+'''Positive DUV resist for spin coating in 600-300nm thickness range:'''
+*Manufacturers website: [https://www.jsrmicro.be/semiconductor/lithography/jsr-krf-photoresists KrF M230Y]
+*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=datasheet+M230Y.pdf KrF M230Y] - '''requires login'''
+'''Positive DUV resist for spin coating in 1600-800nm thickness range:'''
+*Manufacturers website: [https://www.jsrmicro.be/semiconductor/lithography/jsr-krf-photoresists KrF M35G]
+*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=datasheet+M35G.pdf KrF M35G] - '''requires login'''
-*Bottom Anti Reflection Coating (BARC) [http://www.brewerscience.com/products/arc/dry-etch-arc-coatings/248nm-products/duv42s DUV 42S-6] [[Media:Datasheet_DUV42S.pdf |Datasheet DUV42S-6]].
+'''Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range:'''
-*Positive DUV resist for spin coating in 600-300nm thickness range [[Media:M230Y_PSM_annular_130C_PEB.pdf|KRF M230Y]].
+*Manufacturers website: [https://www.microresist.de/en/produkt/uvn-2300-series/ UVN2300-0.8]
-*Positive DUV resist for spin coating in 1600-800nm thickness range [[Media:M35G_Danchip_intro.pdf|KRF M35G]].
+*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=datasheet+UVN2300.pdf UVN2300-0.8] - '''requires login'''
-*Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range [[Media:UVN2300.pdf|UVN2300-0.8]].