Specific Process Knowledge/Thin film deposition/Deposition of Carbon: Difference between revisions
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== Deposition of Carbon == | == Deposition of Carbon == | ||
Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker): | Carbon can be deposited by DC-sputtering method. So far the process has been tested only using [[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-System (Lesker)]]: | ||
*[[/Deposition of C in Sputter-System Lesker|Deposition of Carbon in Sputter-System (Lesker)]] | *[[/Deposition of C in Sputter-System Lesker|Deposition of Carbon in Sputter-System (Lesker)]] | ||
Latest revision as of 19:45, 20 December 2022
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Deposition of Carbon
Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker):