Specific Process Knowledge/Thin film deposition/Deposition of Silicon Carbide: Difference between revisions

From LabAdviser
Eves (talk | contribs)
Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin film deposition/Deposition of Silicon Carbide click here]''' <br clear="all" /> == Deposition of Sicicon Carbide == Sicicon Carbide (SiC) can be deposited by RF-sputtering method. So far the process has been tested only using Sputter-System (Lesker): */Deposition of SiC in Sputter-System Les..."
 
Eves (talk | contribs)
No edit summary
 
(4 intermediate revisions by the same user not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin film deposition/Deposition of Silicon Carbide click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Carbide click here]'''


<br clear="all" />
<br clear="all" />


== Deposition of Sicicon Carbide ==
== Deposition of Silicon Carbide ==


Sicicon Carbide (SiC) can be deposited by RF-sputtering method. So far the process has been tested only using Sputter-System (Lesker):
Silicon Carbide (SiC) can be deposited by RF-sputtering method. So far the process has been tested only using [[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-System (Lesker)]]:


*[[/Deposition of SiC in Sputter-System Lesker|Deposition of SiC in Sputter-System (Lesker)]]
*[[/Deposition of SiC in Sputter-System Lesker|Deposition of SiC in Sputter-System (Lesker)]]

Latest revision as of 19:48, 20 December 2022

Feedback to this page: click here


Deposition of Silicon Carbide

Silicon Carbide (SiC) can be deposited by RF-sputtering method. So far the process has been tested only using Sputter-System (Lesker):