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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Oxide/Deposition_of_Silicon_Oxide_using_Lesker_sputter_tool click here]'''
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=Sputter deposition of SiO<sub>2</sub> using Sputter-System (Lesker)=
=Sputter deposition of SiO<sub>2</sub> using Sputter-System (Lesker)=
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<gallery caption="Uniformity measurements and optical function." widths="500px" heights="500px" perrow="2">
<gallery caption="Uniformity measurements and optical function." widths="400px" heights="350px" perrow="2">
image:eves_SiO2_R-RF_old_Lesker_20220110.png| Uniformity across 100 wafer.
image:eves_SiO2_R-RF_old_Lesker_20220110.png| Uniformity across 100 wafer.
image:eves_refractive_index_SiO2_old_lesker_R-RF_20220718.png| Measured refractive index.
image:eves_refractive_index_SiO2_old_lesker_R-RF_20220718.png| Measured refractive index.
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