Specific Process Knowledge/Cleanroom Chemicals: Difference between revisions
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=Chemicals in the Cleanroom (B346)= | |||
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION.</span> | |||
This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate. | This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate. | ||
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*AZ 351B (NaOH based with disodium tetraborate buffer). Stored in E-4. | *AZ 351B (NaOH based with disodium tetraborate buffer). Stored in E-4. | ||
*AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting). Stored in E-4. | *AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting). Stored in E-4. | ||
*mr-Dev 600 (PGMEA). Stored in Bx1. | *mr-Dev 600 (PGMEA). Stored in Bx1. Or E-4? | ||
*ZED-N50 (n-Amylacetate). Stored in E-4. | *ZED-N50 (n-Amylacetate). Stored in E-4. | ||
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*Ethanol. Stored in C-1, D-3, E-4. | *Ethanol. Stored in C-1, D-3, E-4. | ||
*MIBK. Stored in E-4. | *MIBK. Stored in E-4. | ||
*PGMEA (available as mr-Dev 600). Stored in Bx1. | *PGMEA (available as mr-Dev 600). Stored in Bx1. Or E-4? | ||
*Remover 1165 (NMP). Stored in D-3, E-4. | *Remover 1165 (NMP). Stored in D-3, E-4. | ||
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=Missing from list?= | =Missing from list?= | ||
*AP3000? | |||
*APS-100 (Ammonium persulfate based copper etch)? | *APS-100 (Ammonium persulfate based copper etch)? | ||
*AZ 400K (KOH based with Potassium borate buffer)? | *AZ 400K (KOH based with Potassium borate buffer)? | ||