Specific Process Knowledge/Cleanroom Chemicals: Difference between revisions

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'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
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=Developers=
=Developers=
*AR 600-546 (Amyl acetate). Stored in E-4?
*AR 600-546 (Amyl acetate). Stored in E-4
*AZ 351B (NaOH based with disodium tetraborate buffer). Stored in E-4.
*AZ 351B (NaOH based with disodium tetraborate buffer). Stored in E-4.
*AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting). Stored in E-4.
*AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting). Stored in E-4.
*mr-Dev 600 (PGMEA). Stored in Bx1.
*mr-Dev 600 (PGMEA). Stored in Bx1. Or E-4?
*ZED-N50 (n-Amylacetate). Stored in E-4.
*ZED-N50 (n-Amylacetate). Stored in E-4.


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*Ethanol. Stored in C-1, D-3, E-4.
*Ethanol. Stored in C-1, D-3, E-4.
*MIBK. Stored in E-4.
*MIBK. Stored in E-4.
*PGMEA (available as mr-Dev 600). Stored in Bx1.
*PGMEA (available as mr-Dev 600). Stored in Bx1. Or E-4?
*Remover 1165 (NMP). Stored in D-3, E-4.
*Remover 1165 (NMP). Stored in D-3, E-4.


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=Missing from list?=
=Missing from list?=
*Rinse T1100 (Mixture of Mesitylin, 1,2,4-Trimethylbenzene)?
*AP3000?
*APS-100 (Ammonium persulfate based copper etch)?
*AZ 400K (KOH based with Potassium borate buffer)?
*Ethyl Acetate?
*Ethyl Acetate?
*HSQ?
*HSQ?
*Rinse T1100 (Mixture of Mesitylin, 1,2,4-Trimethylbenzene)?
*UVN2300?
*UVN2300?

Latest revision as of 11:46, 7 February 2023

Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

All links Labmanager requires login.

Feedback to this page: click here

THIS PAGE IS UNDER CONSTRUCTION

This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate.

Acids, bases, and etchants

  • Ammonia solution 28%. Stored in D-3?
  • Ammonium persulphate (Powder). Stored in D-3.
  • BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid). Stored in D-3.
  • BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid). Stored in D-3.
  • BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid). Stored in D-3.
  • Boric acid. Stored in D-3?
  • Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid). Stored in Bx1.
  • HF 5%. Stored in D-3?
  • HF 40%. Stored in D-3?
  • Hydrochloric acid 37%. Stored in D-3.
  • Hydrogen peroxide 31%. Stored in D-3.
  • Nitric acid 69%. Stored in D-3.
  • Phosphoric acid 85%. Stored in D-3.
  • Potassium hydroxide (Pellets). Stored in D-3.
  • Potassium hydroxide 50%. Stored in D-3.
  • Sulfamic acid. Stored in D-3?
  • Sulfuric acid 96%. Stored in D-3.

Developers

  • AR 600-546 (Amyl acetate). Stored in E-4
  • AZ 351B (NaOH based with disodium tetraborate buffer). Stored in E-4.
  • AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting). Stored in E-4.
  • mr-Dev 600 (PGMEA). Stored in Bx1. Or E-4?
  • ZED-N50 (n-Amylacetate). Stored in E-4.

Resists

  • AR-P 6200.09. Stored in E-4.
  • AZ 4562. Stored in E-4, small bottle in E-5.
  • AZ 5214E. Stored in E-4, small bottle in E-5.
  • AZ nLOF 2020. Stored in E-4, small bottle in E-5.
  • AZ MiR 701 (29cps). Stored in E-4, small bottle in E-5.
  • DUV42S-6 (BARC for stepper). Stored in E-4.
  • KRF M230Y 6cp. Stored in E-4.
  • KRF M35G 27cp. Stored in E-4.
  • SU-8 2005. Stored in C-1.
  • SU-8 2035. Stored in C-1.
  • SU-8 2075. Stored in C-1.

Solvents

  • 2-Propanol "IPA". Stored in C-1, D-3, E-4.
  • Acetone. Stored in C-1, D-3, E-4.
  • Anisole. Stored in E-4.
  • AR 600-71 (Mixture of Dioxolane, PGME). Stored in E-4.
  • A-Thinner (Anisole). Stored in E-4.
  • Ethanol. Stored in C-1, D-3, E-4.
  • MIBK. Stored in E-4.
  • PGMEA (available as mr-Dev 600). Stored in Bx1. Or E-4?
  • Remover 1165 (NMP). Stored in D-3, E-4.

Other chemicals

  • HMDS. Stored in E-4.

Missing from list?

  • AP3000?
  • APS-100 (Ammonium persulfate based copper etch)?
  • AZ 400K (KOH based with Potassium borate buffer)?
  • Ethyl Acetate?
  • HSQ?
  • Rinse T1100 (Mixture of Mesitylin, 1,2,4-Trimethylbenzene)?
  • UVN2300?