Main Page/Process Logs/jmli/Pegasus/isotropic/mediumiso1: Difference between revisions
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Latest revision as of 11:34, 28 June 2023
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Unless otherwise stated, the content of this page was created by the dry etch group at DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 9/4-2014 | 4" | travka05 wafer 1.5 µm AZ | Si / 5 % | Pegasus/jmli | 5 minute TDESC clean + MU runs | jml/isotropic/mediumiso1 2:00 minutes | S003961 |
| |
