Specific Process Knowledge/Characterization/SEM Supra 1: Difference between revisions

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[[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM Supra 1 located in basement 346-907]]
''This page is written by DTU Nanolab  internal''
 
[[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM Supra 1 located in basement 346-907.{{photo1}} ]]


=SEM Supra 1=
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===Quality control of length measurement [[Image:section under construction.jpg|70px]]===
===Quality control of length measurement ===
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|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 1'''
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 1'''
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*[http://labmanager.dtu.dk/d4Show.php?id=2493&mach=304 QC procedure for SEM Supra 1]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=2493&mach=275 QC procedure for SEM Supra 1]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=275 Newest QC data for SEM Supra 1]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=275 Newest QC data for SEM Supra 1]<br>



Latest revision as of 10:48, 28 June 2023

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This page is written by DTU Nanolab internal

The SEM Supra 1 located in basement 346-907.Photo: DTU Nanolab internal

SEM Supra 1

The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.

The SEM is the training for fabrication SEM at DTU Nanolab. It means that all new SEM users with no or little SEM experience must be trained on this tool and gain basic knowledge here before being qualified for training on other SEM's.

The SEM Supra 1 was installed in the cleanroom in November 2010, but it has now been relocated in the basement outside the cleanroom, so that users can avoid to clean samples that have been outside the cleanroom before SEM inspection.

The Balzer Sputter is located in the same room as the SEM Supra 1 and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection to avoid charging problems.

Only users with samples that are somehow related to the cleanroom can use this SEM. Other users will have to contact DTU CEN.


The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 1 info page in LabManager,


Performance information


Equipment performance

Equipment SEM Supra 1 (Supra 40VP SEM)
Purpose Imaging and measurement of
  • Conducting samples
  • Semi-conducting samples
  • Thin (~ 5 µm <) layers of non-conducting materials such as polymers
  • Thick polymers, glass or quartz samples
Location
  • Basement of building 346
Performance Resolution
  • 1-2 nm (limited by vibrations)

The resolution is strongly dependent on the type of sample and the skills of the operator.

Instrument specifics Detectors
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • 4 Quadrant Backscatter electron (QBSD)
  • Variable pressure secondary electron (VPSE)
Stage
  • X, Y: 130 × 130 mm
  • T: -4 to 70o
  • R: 360o
  • Z: 50 mm
Electron source
  • FEG (Field Emission Gun) source
Operating pressures
  • Fixed at High vacuum (2 × 10-4mbar - 10-6mbar)
  • Variable at Low vacuum (0.1 mbar - 2 mbar)
Options
  • All software options available
Substrates Batch size
  • Up to 6" wafer with full view
Allowed materials
  • Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool

Quality control of length measurement

Quality Control (QC) for SEM Supra 1

QC limits:

Detector Settings Magnification Measured dimensions Calibration limit Action limit
SE2 EHT 10 kV, WD 10 mm 2.500 k 70x70 μm ± 2 % ± 3 %
SE2 EHT 10 kV, WD 10 mm 17.000 k 10x10 μm ± 2 % ± 3 %
SE2 EHT 5 kV, WD 5 mm 17.000 k 10x10 μm ± 2 % ± 3 %
VPSE EHT 10 kV, WD 10 mm, 17 Pa 17.000 k 10x10 μm ± 2 % ± 3 %
InLens EHT 5 kV, WD 5 mm 200.000 k 1x1 μm ± 2 % ± 3 %
InLens EHT 10 kV, WD 3 mm 1.000.000 k (imaging only) NA NA