Specific Process Knowledge/Characterization/XRD: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD click here]''' | ||
=XRD at Nanolab= | <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | ||
=XRD at DTU Nanolab= | |||
We have two X-ray diffraction setups in building 346: | We have two X-ray diffraction setups in building 346: | ||
*The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom. | *The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom. | ||
*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom. | |||
*The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom. | *The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom. | ||
==Experiments performed with XRD== | |||
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab | |||
==Data analysis== | ==Data analysis== | ||
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. | For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. | ||
If more advanced powder analysis is needed a remote desktop with a | If more advanced powder analysis is needed we provide access to a remote desktop with a licence for the excellent Malvern Panalytical software, HighScore. | ||
*[[/software|Installing SmartLab Studio II]] | *[[/software|Installing SmartLab Studio II]] | ||
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*[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]] | *[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]] | ||
*[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]] | *[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]] | ||
Apart from this commercial software a wide range of free software is available online for data analysis. [https://xrd.mit.edu/xrd-software Here are some suggestions from MIT]. | |||
==Comparison of the XRDs at Nanolab== | ==Comparison of the XRDs at Nanolab== | ||
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b> | |style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b> | ||
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab 9kW Rotating Anode</b> | |||
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b> | |style="background:WhiteSmoke; color:black"|<b>XRD Powder</b> | ||
|- | |- | ||
!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
|style="background:LightGrey; color:black"| Crystal structure analysis and thin film thickness measurement | |style="background:LightGrey; color:black"| Crystal structure analysis | ||
and thin film thickness measurement | |||
|style="background:WhiteSmoke; color:black"| | |||
*Phase ID | |||
*Crystal Size | |||
*Crystallinity | |||
*Quality and degree of orientation | |||
*3D orientation | |||
*Latice strain | |||
*Composition | |||
*Twist | |||
*3D lattice constant | |||
*Thickness | |||
*Roughness | |||
*Density | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Phase ID | *Phase ID | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
3 kW | 3 kW | ||
|style="background:WhiteSmoke; color:black"| | |||
9 kW | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
600 W | 600 W | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Rated tube voltage | Rated tube voltage | ||
|style="background:WhiteSmoke; color:black"| | |||
20 to 45 kV | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
20 to 45 kV | 20 to 45 kV | ||
Line 62: | Line 91: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
2 to 60 mA | 2 to 60 mA | ||
|style="background:WhiteSmoke; color:black"| | |||
2 to 200 mA | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
15 mA | 15 mA | ||
Line 69: | Line 100: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Sealed tube | Sealed tube | ||
|style="background:WhiteSmoke; color:black"| | |||
Rotating Anode | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Sealed tube | Sealed tube | ||
Line 74: | Line 107: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Target | Target | ||
|style="background:WhiteSmoke; color:black"| | |||
Cu | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Cu | Cu | ||
Line 83: | Line 118: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.4 mm x 8 mm (Line/Point) | 0.4 mm x 8 mm (Line/Point) | ||
|style="background:WhiteSmoke; color:black"| | |||
0.1-0.5 mm x 8 mm (Line/Point) | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.4 mm x 12 mm (Line) | 0.4 mm x 12 mm (Line) | ||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan=" | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Goniometer | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Scanning mode | Scanning mode | ||
|style="background:WhiteSmoke; color:black"| | |||
incident / receiver coupled or independent | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
incident / receiver coupled or independent | incident / receiver coupled or independent | ||
Line 96: | Line 135: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Goniomenter radius | Goniomenter radius | ||
|style="background:WhiteSmoke; color:black"| | |||
300 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
300 mm | 300 mm | ||
Line 103: | Line 144: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Minimum step size | Minimum step size | ||
|style="background:WhiteSmoke; color:black"| | |||
0.0001° (0.36") | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.0001° (0.36") | 0.0001° (0.36") | ||
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|- | |- | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Sample stage | Sample stage motion | ||
|style="background:WhiteSmoke; color:black"| | |||
*χ:-5~+95° | |||
*φ:0~360° | |||
*Z:-4~+1 mm | |||
*X,Y:±50 mm for a 100 mm wafer | |||
*Rx,Ry:-5~+5° | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*χ:-5~+95° | *χ:-5~+95° | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Fixed with rotation | Fixed with rotation | ||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics | ||
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*In-Plane Parallel Slit Collimator (PSC) | *In-Plane Parallel Slit Collimator (PSC) | ||
*Soller slit | *Soller slit | ||
* | *Automatic variable divergence slit | ||
*Length limiting slits | |||
|style="background:WhiteSmoke; color:black"| | |||
*Cross Beam Optics(CBO) | |||
*Ge(400)x2 monochromator | |||
*In-Plane Parallel Slit Collimator (PSC) | |||
*Soller slit | |||
*Automatic variable divergence slit | |||
*Length limiting slits | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.04° soller slit | *0.04° soller slit | ||
*Ni and Cu filter | *Ni and Cu filter | ||
*Divergence slits | *Divergence slits | ||
*Beam | *Beam masks | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Receiver side | |style="background:LightGrey; color:black"|Receiver side | ||
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*Parallel slit analysers (PSA) | *Parallel slit analysers (PSA) | ||
*Ge(220)x2 analyser | *Ge(220)x2 analyser | ||
|style="background:WhiteSmoke; color:black"| | |||
*Automatic variable scattering slit | |||
*Automatic variable receiver slit | |||
*Parallel slit analysers (PSA) | |||
*Ge(400)x2 analyser | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.04° soller slit | *0.04° soller slit | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Measurement temperature | |style="background:LightGrey; color:black"|Measurement temperature | ||
|style="background:WhiteSmoke; color:black"| | |||
Room temperature | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Room temperature | Room temperature | ||
Line 161: | Line 218: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
up to 150 mm wafers | up to 150 mm wafers | ||
Thickness max 21 mm | |||
|style="background:WhiteSmoke; color:black"| | |||
up to 150 mm wafers | |||
Thickness max 21 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Only for powders | Only for powders | ||
Line 166: | Line 229: | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
All materials | All materials approved in the cleanroom. | ||
No powders or dusty materials. | |||
|style="background:WhiteSmoke; color:black"| | |||
All materials have to be approved | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
All materials have to be approved | All materials have to be approved |
Latest revision as of 18:09, 25 September 2024
Feedback to this page: click here
Unless otherwise stated, this page is written by DTU Nanolab internal
XRD at DTU Nanolab
We have two X-ray diffraction setups in building 346:
- The XRD SmartLab primarily for thin film analysis inside the cleanroom.
- The XRD SmartLab 9kW Rotating Anode multipurpose system outside the cleanroom.
- The XRD Powder for phase analysis of powders outside the cleanroom.
Experiments performed with XRD
- List and description of possible XRD measurements with typical setup requirements Note mostly relevant for XRD Smartlab
Data analysis
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed we provide access to a remote desktop with a licence for the excellent Malvern Panalytical software, HighScore.
- Installing SmartLab Studio II
- Converting data from XRD Powder to SmartLab Studio II
- Guide for using SmartLab Studio II for data analysis
- Guide for using HighScore Plus for advanced powder data analysis
Apart from this commercial software a wide range of free software is available online for data analysis. Here are some suggestions from MIT.
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD SmartLab 9kW Rotating Anode | XRD Powder | |
---|---|---|---|---|
Purpose | Crystal structure analysis
and thin film thickness measurement |
|
|
|
X-ray generator |
Maximum rated output |
3 kW |
9 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
2 to 200 mA |
15 mA | |
Type |
Sealed tube |
Rotating Anode |
Sealed tube | |
Target |
Cu |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.1-0.5 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage motion |
|
|
Fixed with rotation | |
Optics | Incident side |
|
|
|
Receiver side |
|
|
| |
Substrates | Measurement temperature |
Room temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers Thickness max 21 mm |
up to 150 mm wafers Thickness max 21 mm |
Only for powders | |
Allowed materials |
All materials approved in the cleanroom. No powders or dusty materials. |
All materials have to be approved |
All materials have to be approved |