Specific Process Knowledge/Characterization/XPS/K-Alpha: Difference between revisions
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[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager] | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager] | ||
== | [[Image:XPS K-Alpha.jpg |frame|x300px|The K-Alpha has its back turned towards the [[Specific Process Knowledge/Characterization/XPS/Nexsa | XPS Nexsa]] in room 904 in building 346.]] | ||
==Process information== | |||
The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis|Element analysis]]. | The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis|Element analysis]]. | ||
Latest revision as of 08:37, 25 October 2021
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The XPS K-Alpha
Name: XPS K-Alpha
Vendor: Thermofisher
The XPS K-Alpha allows you to analyse a broad range of samples with the XPS technique.
The user manual(s), user APV(s), technical information and contact information are be found in LabManager:
Process information
The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.
More about the different possibilities of the XPS instrument is found here:
Getting access to the XPS
Click HERE to see information on how to get access to the XPS.
Performance of XPS K-Alpha
| Purpose | Chemical analysis |
|
|---|---|---|
| Performance | Spot size | Can be set between 30µm - 400µm |
| Probing depth | Depending on probed element. Max probe depth lies within 10-200 Å. | |
| Resolution | Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected. | |
| Charge compensation |
Flood gun can be used for charge compensation of non conductive samples | |
| Finding structures | Choose measuring spot from camera image (magnified) | |
| Depth profiling | Purpose | With ion beam etch the top layer of the material can be removed, to do a depth profiling |
| Ion beam size | About 3x1 mm | |
| Substrates | Substrate size |
Maximum 60x60 mm |
| Substrate thickness |
Maximum height about 20 mm |