Specific Process Knowledge/Characterization/XPS: Difference between revisions

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+{{Template:Author-jmli1}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
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 ==The XPS tools at DTU Nanolab==
-[[Image:XPS K-Alpha.jpg |frame|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.]]
+[[Image:XPS K-Alpha.jpg |thumb|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.{{photo1}} ]]
-[[Image:XPS Nexsa.png |frame|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. It's panels, however, hide a whole range of supplementary techniques.]]
+[[Image:XPS Nexsa.png |thumb|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.{{photo1}} ]]
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 *[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
 *[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
-*[[/Carbon contamination|Carbon contamination]]
+*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination|Carbon contamination]]
 *[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
+*[[Specific Process Knowledge/Characterization/XPS/Training | Links to instruction videos ]]
 == Getting access to the XPS tools==
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 == Analyzing XPS spectra ==
-The analysis of XPS spectra is an art in itself. Click on the link below to find a some examples in which the Avantage software package has been used to extract information from experiments.
+The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.
-*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data]]
+*[[Specific Process Knowledge/Characterization/XPS/SoftwareInstall|How to access XPS software: Download/install or by access to server]]
+*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data with Avantage]]
+*[[Specific Process Knowledge/Characterization/XPS/Export2CasaXPS | Export Avantage data to CasaXPS]]
 ==Techniques and option on the XPS tools==
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 |-
 !style="background:silver; color:black;" align="left" colspan="2"|Equipment
-!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |K-Alpha]]
+!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha (Manufactured by Thermofisher)]]
-!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |Nexsa]]
+!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa (Manufactured by Thermofisher)]]
 |-
 !style="background:silver; color:black;" align="left" rowspan="2"|Purpose
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 |style="background:LightGrey; color:black"|Alternative/complementary
+|style="background:WhiteSmoke; color:black"|
+* Work function measurements
 |style="background:WhiteSmoke; color:black"|
-|style="background:WhiteSmoke; color:black"|
+* Work function measurements
-* Workfunction measurements
+* [[Specific Process Knowledge/Characterization/XPS/UPS technique| Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source]]
-* Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source
+* [[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]]
-* Ion Scattering Spectroscopy (ISS)
+* [[Specific Process Knowledge/Characterization/XPS/REELS|Reflected Electron Energy Loss Spectroscopy or REELS]]
-* Reflected Electron Energy Loss Spectroscopy
 * Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
+* [[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]]
 |-
 !rowspan="5" style="background:silver; color:black" align="left"| Performance
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 |style="background:LightGrey; color:black"|Depth profiles
 |style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
-* Monoatomic energy range 200-3 keV
+* Monoatomic energy range 200-3000 eV
-|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS)
+|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source ([[Media:MAGCIS.pdf |MAGCIS]])
-* Monoatomic energy range 200-4 keV
+* Monoatomic energy range 200-4000 eV
 * Cluster mode energy range: 2-8 keV
 *Cluster size range: 75-2000 atoms
 |-
 !rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
-|style="background:LightGrey; color:black"|Sample holder size: 6x6 cm
+|style="background:LightGrey; color:black"|Sample holder size
-|style="background:WhiteSmoke; color:black"|
+|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
-Maximum 60x60 mm
+|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
 |-
-| style="background:LightGrey; color:black"|Substrate
+| style="background:LightGrey; color:black"|Sample height
-|style="background:WhiteSmoke; color:black"|
+|style="background:WhiteSmoke; color:black"| Maximum 20 mm
-Maximum height about 20 mm
+|style="background:WhiteSmoke; color:black"| Maximum 20 mm
 |-
 |}