Specific Process Knowledge/Back-end processing/LatticeAxe: Difference between revisions

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==Equipment performance and process related parameters==
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Back-end_processing/LatticeAxe click here]'''


{| border="2" cellspacing="0" cellpadding="2"
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
== The Cleaver: LatticeAxe ==
|style="background:WhiteSmoke; color:black"|<b>Wafer scriber</b>
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose
|style="background:LightGrey; color:black"|Scribing of Si wafers for easy breakage into single dies..
|style="background:WhiteSmoke; color:black"|


|-
The Cleaver: LatticeAxe is designed for cleaving wafers into smaller pieces without leaving any particles on the sample. It works by making a small mark in the side of the sample that is then used as a start point for the cleaving.
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance
|style="background:LightGrey; color:black"|Scribe lines
|style="background:WhiteSmoke; color:black"| Lines can be made perpendicular to each other by turning chuck 90°


|-
The equipment is placed in the left drawer underneath fumehood 5: Special purposes. When operated the the Cleaver: lattice axe should always be placed inside Fume hood 5.
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
|style="background:LightGrey; color:black"|Wafer thickness
|style="background:WhiteSmoke; color:black"| Adjustable by increasing or decreasing the load of the diamond pen


|-
[[File:LatticeAxe placer prøve.JPG|400px]]
|style="background:LightGrey; color:black"|Distance between scribe lines
|style="background:WhiteSmoke; color:black"| Approx. 5 mm


|-
'''Approved Materials''':
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
|style="background:LightGrey; color:black"| Size of Substrate
|style="background:WhiteSmoke; color:black"| Up to 100 mm wafers


|-
*Si
|style="background:LightGrey; color:black"|Allowed materials
*Quartz
|style="background:WhiteSmoke; color:black"| All but only Si where the scribe lines are made
*Pyrex (Borofloat 33)
*GaAs
*InP
*Sapphire


The LatticeAxe can cleave samples from 100mm down to 10mm. In some cases it can even be used on larger samples please contact wetchemistry group for more information


|-  
DTU-Nanolab has 3 different types of Cleavers see the Labadviser pages for the '''[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Back-end_processing/FlexScribe FlexScribe]''' and the '''[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Back-end_processing/FlipScribe FlipScribe]''' for more information.
|}
 
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Latest revision as of 07:43, 1 February 2023

Feedback to this page: click here

Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

The Cleaver: LatticeAxe

The Cleaver: LatticeAxe is designed for cleaving wafers into smaller pieces without leaving any particles on the sample. It works by making a small mark in the side of the sample that is then used as a start point for the cleaving.

The equipment is placed in the left drawer underneath fumehood 5: Special purposes. When operated the the Cleaver: lattice axe should always be placed inside Fume hood 5.

Approved Materials:

  • Si
  • Quartz
  • Pyrex (Borofloat 33)
  • GaAs
  • InP
  • Sapphire

The LatticeAxe can cleave samples from 100mm down to 10mm. In some cases it can even be used on larger samples please contact wetchemistry group for more information

DTU-Nanolab has 3 different types of Cleavers see the Labadviser pages for the FlexScribe and the FlipScribe for more information.