Template:SEM comparison table 314: Difference between revisions
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*X Ray Analysis with EDS | *X Ray Analysis with EDS | ||
*Crystallographic analysis using EBSD and both On and Off axis TKD | *Crystallographic analysis using EBSD and both On and Off axis TKD | ||
* In-situ experiments with Heating and Gas injection | |||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
*Charge reduction in Low Vac | *Charge reduction in Low Vac | ||
*X Ray Analysis with EDS and WDS | |||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
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** 4.0nm at 30kV (BSE) | ** 4.0nm at 30kV (BSE) | ||
** > 12nm at 3kV (SE) --> | ** > 12nm at 3kV (SE) --> | ||
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*High Vacuum operation in Mode II: | |||
**1.0 nm at 15 kV (TLD detector and optimum working distance) | |||
**1.8 nm at 1 kV (TLD detector and optimum working distance) | |||
*Low Vacuum operation in Mode II: | |||
**1.5 nm at 10 kV (Helix detector and optimum working distance) | |||
**1.8 nm at 3 kV (Helix detector and optimum working distance) | |||
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* High vacuum | * High vacuum | ||
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**3.0 nm at 3 kV (SE) | **3.0 nm at 3 kV (SE) | ||
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* Electron Column | * Electron Column Operation in Mode II | ||
**0.8nm @15kV | **0.8nm @15kV | ||
**0.9nm @1kV | **0.9nm @1kV | ||
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* Z 50mm | * Z 50mm | ||
* R 360⁰ | * R 360⁰ | ||
* T 70⁰ | * T 70⁰ Manual | ||
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* X 150mm Piezo | * X 150mm Piezo |
Latest revision as of 08:21, 26 March 2020
Equipment | Nova | QFEG | AFEG | Helios | |
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Equipment position | Building 314 Room 060 | Building 314 Room 011 | Building 314 Room 034 | Building 314 Room 061 | |
Resolution | The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon | ||||
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Detectors |
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Stage specifications |
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Options | B | C | D | E | |
Max sample size | Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size |