Template:SEM comparison table 314: Difference between revisions
No edit summary |
No edit summary |
||
(4 intermediate revisions by 2 users not shown) | |||
Line 1: | Line 1: | ||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | ||
|- | |- | ||
|- | |- | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" valign="top" | ||
! Equipment | ! Equipment | ||
<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S|SEM Inspect S]] --> | <!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S|SEM Inspect S]] --> | ||
Line 13: | Line 13: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" valign="top" | ||
!Purpose | !Purpose | ||
<!-- | | <!-- | | ||
Line 24: | Line 24: | ||
*X Ray Analysis with EDS | *X Ray Analysis with EDS | ||
*Crystallographic analysis using EBSD and both On and Off axis TKD | *Crystallographic analysis using EBSD and both On and Off axis TKD | ||
* In-situ experiments with Heating and Gas injection | |||
| | | | ||
*Conductive samples in High Vac | *Conductive samples in High Vac | ||
Line 33: | Line 34: | ||
*Conductive samples in High Vac | *Conductive samples in High Vac | ||
*Charge reduction in Low Vac | *Charge reduction in Low Vac | ||
*X Ray Analysis with EDS and WDS | |||
| | | | ||
*Conductive samples in High Vac | *Conductive samples in High Vac | ||
Line 41: | Line 43: | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" valign="top" | ||
!Equipment position | !Equipment position | ||
<!-- |CEN Building 314 --> | <!-- |CEN Building 314 --> | ||
Line 51: | Line 53: | ||
|- | |- | ||
|style="background: | |style="background:Whitesmoke; color:black" rowspan="2" align="left" valign="top" |'''Resolution''' | ||
|style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon | |style="background:Whitesmoke; color:black" colspan="5" align="center" valign="top"| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon | ||
|- | |- | ||
|- valign="top" | |||
<!-- | | <!-- | | ||
* High-vacuum | * High-vacuum | ||
**3.0nm at 30kV (SE) | |||
**10nm at 3kV (SE) | |||
**4.0nm at 30kV (BSE) | |||
* Low-vacuum | * Low-vacuum | ||
**3.0nm at 30kV (SE) | |||
** 4.0nm at 30kV (BSE) | |||
** > 12nm at 3kV (SE) --> | |||
| | | | ||
*High Vacuum operation in Mode II: | |||
**1.0 nm at 15 kV (TLD detector and optimum working distance) | |||
**1.8 nm at 1 kV (TLD detector and optimum working distance) | |||
*Low Vacuum operation in Mode II: | |||
**1.5 nm at 10 kV (Helix detector and optimum working distance) | |||
**1.8 nm at 3 kV (Helix detector and optimum working distance) | |||
| | | | ||
* High vacuum | * High vacuum | ||
**0.8 nm at 30 kV (STEM) | |||
**1.0 nm at 30 kV (SE) | |||
**2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE) | |||
*High vacuum with beam deceleration option | *High vacuum with beam deceleration option | ||
**3.0 nm at 1 kV (BD mode + BSE) | |||
* Low vacuum - 1.4 nm at 30 kV (SE) | * Low vacuum - 1.4 nm at 30 kV (SE) | ||
**2.5 nm at 30 kV (BSE) | |||
**3.0 nm at 3 kV (SE) | |||
* Extended vacuum mode (ESEM) | * Extended vacuum mode (ESEM) | ||
**1.4 nm at 30 kV (SE) | |||
| | | | ||
* High vacuum | * High vacuum | ||
**0.8 nm at 30 kV (STEM) | |||
**1.0 nm at 30 kV (SE) | |||
**2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE) | |||
*High vacuum with beam deceleration option | *High vacuum with beam deceleration option | ||
**3.0 nm at 1 kV (BD mode + BSE) | |||
* Low vacuum - 1.4 nm at 30 kV (SE) | * Low vacuum - 1.4 nm at 30 kV (SE) | ||
**2.5 nm at 30 kV (BSE) | |||
**3.0 nm at 3 kV (SE) | |||
| | | | ||
* Electron Column | * Electron Column Operation in Mode II | ||
**0.8nm @15kV | |||
**0.9nm @1kV | |||
* Ion Column | * Ion Column | ||
**4.5nm @ 30kV | |||
|- | |- | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" valign="top" | ||
!Detectors | !Detectors | ||
<!-- | | <!-- | | ||
Line 138: | Line 148: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" valign="top" | ||
!Stage specifications | !Stage specifications | ||
<!-- | | <!-- | | ||
Line 163: | Line 173: | ||
* Z 50mm | * Z 50mm | ||
* R 360⁰ | * R 360⁰ | ||
* T 70⁰ | * T 70⁰ Manual | ||
| | | | ||
* X 150mm Piezo | * X 150mm Piezo | ||
Line 181: | Line 191: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" valign="top" | ||
!Max sample size | !Max sample size | ||
|style="background:Whitesmoke; color:black" colspan="5" align="center"| Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size | |style="background:Whitesmoke; color:black" colspan="5" align="center"| Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size |
Latest revision as of 08:21, 26 March 2020
Equipment | Nova | QFEG | AFEG | Helios | |
---|---|---|---|---|---|
Purpose |
|
|
|
| |
Equipment position | Building 314 Room 060 | Building 314 Room 011 | Building 314 Room 034 | Building 314 Room 061 | |
Resolution | The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon | ||||
|
|
|
| ||
Detectors |
|
|
|
| |
Stage specifications |
|
|
|
| |
Options | B | C | D | E | |
Max sample size | Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size |