Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 3kW 100%: Difference between revisions
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| Trench width (um)||250.32||160.36||80.48||40.42||25.42||16.66||10.43||8.38||5.02||2.95||3 | | Trench width (um)||250.32||160.36||80.48||40.42||25.42||16.66||10.43||8.38||5.02||2.95||3 |
Latest revision as of 10:29, 9 August 2022
Date | Substrate Information | Process Information | Results | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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Wafer info | Material/ Exposed area | Condi- tioning | Recipe | Wafer ID | Comments | SEM images | Picoscope | Numbers | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
27/11-2019 | Medusa One AZ Mir | Si / 10% | stab-19 TDESC clean5, RF MU runs | nanolab/ vy / DREM / DREM 3kW 100% 120 cycles or 10:0 minutes | S018605 | Process log entry |
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