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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/High_resolution_patterning_with_HSQ click here]'''
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/High_resolution_patterning_with_HSQ click here]'''


* ''This work was done by Bingdong Chang and Xiaoli Zhu in 2016;''
* ''This work was done by Bingdong Chang and Xiaoli Zhu in 2016.''


* ''This page was edited by Bingdong Chang 23 October 2017.''
* ''This page was edited by Bingdong Chang 23 October 2017.''
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It is therefore not recommended to use HSQ as a trainings resist.
It is therefore not recommended to use HSQ as a trainings resist.


/BR
The details of the process is shown below in the table:
The details of the process is shown below in the table:
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
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