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Specific Process Knowledge/Lithography/EBeamLithography/High resolution patterning with HSQ: Difference between revisions

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It is therefore not recommended to use HSQ as a trainings resist.
It is therefore not recommended to use HSQ as a trainings resist.


/BR
The details of the process is shown below in the table:
The details of the process is shown below in the table:
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
<gallery caption="Processing parameters for high resolution HSQ patterning" widths="600" heights="300" perrow="1">
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