Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA: Difference between revisions
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Latest revision as of 11:23, 28 April 2023
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 18/8-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004257 | OLD showerhead |
|
| 20/11-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004580 | OLD showerhead |
|
| 1/12-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004671 | New showerhead |
|
| 15/12-2014 | 4" Nanolab QC Wafer | 1.5 µm AZ resist, daq2 mask | Si / 10 % | Pegasus/jmli | 10 minute TDESC clean, 10 minute PR strip post process | Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes | S004746 | New showerhead |
|
