Jump to content

Specific Process Knowledge/Characterization/SEM Supra 2: Difference between revisions

← Older edit
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,366 edits
 
(11 intermediate revisions by 3 users not shown)
Line 2: Line 2:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2  click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2  click here]'''


''This page is written by DTU Nanolab  internal''


[[image:IMAG0188.jpg|450x450px|right|thumb|The SEM Supra 2 located in cleanroom C-1]]
[[image:SEM_Supra_2.jpg|500x500px|right|thumb|The SEM Supra 2 is located in cleanroom C-1. {{photo1}} ]]


=SEM Supra 2=
=SEM Supra 2=
Line 9: Line 10:
The SEM Supra 2 is a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.
The SEM Supra 2 is a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.


The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the SE2 and InLens detectors will no longer work, and a dedicated VPSE detector have to be used instead.


This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.
This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.
Line 15: Line 16:
All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  
All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  


The SEM is equipped with an Oxford Instruments X-MaxN 50 EDX detector and AZtec software. EDX (Energy dispersive X-ray) detection is used for element composition analysis in a small area. A specific training is needed for users that want to use the EDX detector.   
The SEM is equipped with an Oxford Instruments Aztec Advanced Ultim 65 mm2 SDD EDX detector and Aztec software. EDX (Energy dispersive X-ray) detection is used for element composition analysis in a small area. A specific training is needed for users that want to use the EDX detector.   


The SEM Supra2 in located in the cleanroom. It was installed in December 2013.
The SEM Supra 2 in located in the cleanroom. It was installed in December 2013.




Line 50: Line 51:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Cleanroom of DTU Danchip
*Cleanroom of DTU Nanolab
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
Line 56: Line 57:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1-2 nm (limited by vibrations)
*1-2 nm (limited by vibrations)
The resolution is strongly dependent on the type of sample and the skills of the operator.
The resolution is strongly dependent on the SEM settings, the sample type and the skills of the operator
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
|style="background:LightGrey; color:black"|Detectors
|style="background:LightGrey; color:black"|Detectors
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Secondary electron (Se2)
*Secondary electron (SE2)
*Inlens secondary electron (Inlens)
*Inlens secondary electron (Inlens)
*4 Quadrant Backscatter electron (QBSD)
*Variable pressure secondary electron (VPSE)
*Variable pressure secondary electron (VPSE)
|-
|-
|style="background:LightGrey; color:black"|Stage
|style="background:LightGrey; color:black"|Stage
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*X, Y: 150 × 150 mm
*X, Y: 150 mm × 150 mm
*T: -10 to 70<sup>o</sup>
*T: -10 to 70<sup>o</sup>
*R: 360<sup>o</sup>
*R: 360<sup>o</sup>
Line 79: Line 79:
|style="background:LightGrey; color:black"|Operating pressures
|style="background:LightGrey; color:black"|Operating pressures
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Fixed at High vacuum (2 &times; 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
*Fixed at High vacuum (2 &times; 10<sup>-4</sup >mbar - 10<sup>-6</sup> mbar)
*Variable at Low vacuum (0.1 mbar - 2 mbar)
*Variable at Low vacuum (0.1 mbar - 2 mbar)
|-
|-
Line 86: Line 86:
*Antivibration platform
*Antivibration platform
*Fjeld M-200 airlock taking up to 8" wafers
*Fjeld M-200 airlock taking up to 8" wafers
*Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package
*Oxford Instruments Aztec Advanced Ultim 65 mm<sup>2</sup> SDD EDX detector and Aztec software package
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
Line 97: Line 97:
*Any standard cleanroom material
*Any standard cleanroom material
|-  
|-  
|}
==Quality control of length measurements ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 2'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=3531&mach=327 QC procedure for SEM Supra 2]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=327 Newest QC data for SEM Supra 2]<br>
'''QC limits:'''
{| {{table}}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
! Detector
! Settings
! Magnification
! Measured dimensions
! Calibration limit
! Action limit
|-
|SE2
| EHT 10 kV, WD 10 mm
| 2.500 k
| 70x70 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 10 kV, WD 10 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|-
|SE2
| EHT 10 kV, WD 10 mm
| 75.000 k
| 2x2 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 5 kV, WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| VPSE
| EHT 10 kV, WD 10 mm, 17 Pa
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 5 kV, WD 5 mm
| 200.000 k
| 1x1 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 10 kV, WD 3 mm
| 1.000.000 k
| (imaging only)
| NA
| NA
|-
|}
|-
|}
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/SEM_Supra_2"