Jump to content

Specific Process Knowledge/Characterization/SEM Supra 2: Difference between revisions

← Older edit
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
 
(5 intermediate revisions by 3 users not shown)
Line 2: Line 2:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2  click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2  click here]'''


''This page is written by DTU Nanolab  internal''


[[image:IMAG0188.jpg|450x450px|right|thumb|The SEM Supra 2 located in cleanroom C-1]]
[[image:IMAG0188.jpg|450x450px|right|thumb|The SEM Supra 2 is located in cleanroom C-1. {{photo1}} ]]


=SEM Supra 2=
=SEM Supra 2=
Line 11: Line 12:
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.


This SEM has large chamber volume compared to the other SEMs at Danchip. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.
This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.


All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  
All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  
Line 50: Line 51:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Cleanroom of DTU Danchip
*Cleanroom of DTU Nanolab
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
Line 97: Line 98:
*Any standard cleanroom material
*Any standard cleanroom material
|-  
|-  
|}
==Quality control of length measurement ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 2'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=3531&mach=327 QC procedure for SEM Supra 2]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=327 Newest QC data for SEM Supra 2]<br>
'''QC limits:'''
{| {{table}}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
! Detector
! Settings
! Magnification
! Measured dimensions
! Calibration limit
! Action limit
|-
|SE2
| EHT 10 kV, WD 10 mm
| 2.500 k
| 70x70 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 10 kV, WD 10 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|-
|SE2
| EHT 10 kV, WD 10 mm
| 75.000 k
| 2x2 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 5 kV, WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| VPSE
| EHT 10 kV, WD 10 mm, 17 Pa
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 5 kV, WD 5 mm
| 200.000 k
| 1x1 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 10 kV, WD 3 mm
| 1.000.000 k
| (imaging only)
| NA
| NA
|-
|}
|-
|}
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/SEM_Supra_2"