Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch click here]''' | ||
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== Etch processes designed for stepper resists == | == Etch processes designed for stepper resists == | ||
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| rowspan="2" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | | rowspan="2" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | ||
! width="40" rowspan="2" | Runs | ! width="40" rowspan="2" | Runs | ||
! width="300" | Key words | ! width="300" rowspan="2" | Key words | ||
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| degs | | degs | ||