Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch click here]''' | ||
<!--Checked for updates on 14/5-2018 - ok/jmli --> | <!--Checked for updates on 14/5-2018 - ok/jmli --> | ||
<!--Checked for updates on 24/8-2021. ok/ jmli--> | |||
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== Etch processes designed for stepper resists == | == Etch processes designed for stepper resists == | ||
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|+ '''Process parameters''' | |+ '''Process parameters''' | ||
|- | |- | ||
! rowspan=" | ! rowspan="3" width="100"| Recipe | ||
! rowspan=" | ! rowspan="3" width="20"| Step | ||
! rowspan="2" width="20"| Temp. | ! rowspan="2" width="20"| Temp. | ||
! colspan="6" | Deposition step | ! colspan="6" | Deposition step | ||
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! width="40" | Coil | ! width="40" | Coil | ||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power|Platen]] | | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power|Platen]] | ||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | | rowspan="2" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | ||
! width="40" | Runs | ! width="40" rowspan="2" | Runs | ||
! width="300" | Key words | ! width="300" rowspan="2" | Key words | ||
|- | |||
| degs | |||
| s | |||
| mt | |||
| sccm | |||
| sccm | |||
| sccm | |||
| W | |||
| s | |||
| mt | |||
| sccm | |||
| sccm | |||
| sccm | |||
| W | |||
| W | |||
|- | |- | ||
! polySOI-10 <!-- recipe name --> | ! polySOI-10 <!-- recipe name --> | ||