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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBSD_of_Si click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBSD_of_Si click here]'''  


==Test of the deposition rate of Silicon and film characteristics==
==Test of the deposition rate of Silicon and film characteristics==
'''''The work in this section was done by Kristian Hagsted Rasmussen @DTU Nanolab (former DTU Danchip) before 2012 - '''''
'''''with followup by Berit Herstrøm (bghe) @DTU Nanolab.'''''
Please note that it is from 2022 no longer possible to deposit Si with the Ion beam etcher here at Nanolab.
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