Main Page/Process Logs/jmli/Pegasus/isotropic/mediumiso1: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/isotropic/mediumiso1 click here]''' | |||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | <!--Checked for updates on 30/7-2018 - ok/jmli --> | ||
{ | <!--Checked for updates on 5/10-2020 - ok/jmli --> | ||
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|+ '''Process runs''' | |+ '''Process runs''' | ||
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Latest revision as of 11:34, 28 June 2023
Feedback to this page: click here
Unless otherwise stated, the content of this page was created by the dry etch group at DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 9/4-2014 | 4" | travka05 wafer 1.5 µm AZ | Si / 5 % | Pegasus/jmli | 5 minute TDESC clean + MU runs | jml/isotropic/mediumiso1 2:00 minutes | S003961 |
| |
