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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DryEtchProcessing/Bonding click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DryEtchProcessing/Bonding click here]'''
<!--Checked for updates on 14/5-2018 - ok/jmli -->
<!--Checked for updates on 25/11-2019 - ok/jmli -->
<!--Checked for updates on 28/4-2023 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->


{{Template:Contentbydryetch}}


== Carriers for dry etching: Temporary bonding of samples or carriers for none bonded samples ==
== Carriers for dry etching: Temporary bonding of samples or carriers for none bonded samples ==
<!--Checked for updates on 3/2-2023 - ok/jmli -->


=== Purpose ===
=== Purpose ===


Many tools are set up for processing one particular size of wafer. The reasons why a tool processes one size of wafers and not others are numerous - they may include:
 
The dry etch tools are set up for processing one particular size of wafer. The reasons why a tool processes one size of wafers and not others are numerous - they may include:
* Hardware availability
* Hardware availability
* Processes required by users
* Processes required by users
The dry etch tools at Danchip all have a default wafer size and may have other sizes of electrodes available. Other sizes of wafers or chips may also be processed but they will requrie the use of a carrier wafer. Using a carrier is also often required if the side of the wafer facing the electrode has structures.
The dry etch tools at Nanolab all have a default wafer size and may have other sizes of electrodes available. Other sizes of wafers or chips may also be processed but they will require the use of a carrier wafer. Using a carrier is also often required if the side of the wafer facing the electrode has structures.


{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Processesing different sizes of wafers or chips in the dry etch tools at Danchip '''
|+ '''Processing different sizes of wafers or chips in the dry etch tools at Nanolab '''
|-
|-
! Tool
! Tool
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! Sizes of wafers or chips that may bonded and processed
! Sizes of wafers or chips that may bonded and processed
|-
|-
![[Specific Process Knowledge/Etch/DRIE-Pegasus|DRIE-Pegasus]]
![[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-1|DRIE-Pegasus-1]]
| 4" wafer
| 4" wafer
| 6" wafer
| 6" wafer
| Samples smaller than a 4" wafer
| Samples smaller than a 4" wafer
|-
![[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2|DRIE-Pegasus-2]]
| 6" wafer
| 4" wafer
| Samples smaller than a 6" wafer
|-
|-
![[Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch)|ASE]]
![[Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch)|ASE]]
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<ol>
<ol>
  <li>Find a carrier wafer that has the right size. Keep in mind that it matters a great deal if the surface will be etched or not, i.e. if it has oxide or not. </li>
  <li>Find a carrier wafer that has the right size. Keep in mind that it matters a great deal if the surface will be etched or not, i.e. if it has oxide or not. </li>
  <li>Take a piece of crystalbond from the shelf in cleanroom 1. </li>
  <li>Take a piece of crystalbond from the shelf in cleanroom A-1. </li>
  <li>Take your items (substrate, carrier wafer, crystalbond and tweezers) to the hotplate in cleanroom 1. </li>
  <li>Take your items (substrate, carrier wafer, crystalbond and tweezers) to the hotplate in cleanroom C-1. </li>
[[image:bonding-n01x.jpg]]
[[image:bonding-n01x.jpg]]
  <li>Put the carrier wafer on the hotplate. A 6" wafer will fit not in the recess but it will get sufficiently hot if you leave it there for some seconds longer. </li>
  <li>Put the carrier wafer on the hotplate. <!-- A 6" wafer will fit not in the recess but it will get sufficiently hot if you leave it there for some seconds longer. --> </li>
  <li>Apply a very thin layer of crystalbond in a circular motion so that it covers some 70 % of the area to be covered by your substrate. Do not apply too much! Little does it.. </li>
  <li>Apply a very thin layer of crystalbond in a circular motion so that it covers some 70 % of the area to be covered by your substrate. Do not apply too much! Little does it.. </li>
  <li>Gently put your wafer on the crystalbond. </li>
  <li>Gently put your wafer on the crystalbond. </li>