Specific Process Knowledge/Characterization/XPS/XPS Depth profiling: Difference between revisions
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=Depth profiling= | =Depth profiling= | ||
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* Polysilicon | * Polysilicon | ||
[[File:profile sandwich 3.PNG|700px]] | [[File:profile sandwich 3.PNG|700px|{{photo1}}]] | ||
In the spectra required to make such a depth profile, one can distinguish the various chemical environments of silicon depending on whether it is bonded to: | |||
* Silicon as in the bulk (oxidation state 0). | |||
* Oxygen, either fully oxidized (oxidation state IV) in SiO<sub>2</sub> or in intermediate states with a mixture of silicon and oxygen bonds (oxidation state I, II and III) | |||
* Nitrogen, also fully oxidized (oxidation state IV) | |||
and plot their atomic percentages along with the percentages of oxygen and nitrogen. | |||