Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions
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To request for an e-beam training session, contact e-beam@ | To request for an e-beam training session, contact e-beam@nanolab.dtu.dk; a DTU Nanolab personnel will hereafter provide a time slot. For safety reasons, even fully trained users are only authorized to mount substrates into the e-beam cassettes but not authorized to load the cassettes into the autoloader. | ||
To use the e-beam writer, book the machine via LabManager, and ask help from DTU | To use the e-beam writer, book the machine via LabManager, and ask help from DTU Nanolab staff to load your cassette into the robot loader (autoloader). | ||
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After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and leave the cassette on the designated table. | After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and leave the cassette on the designated table. | ||
If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU | If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Nanolab personel unmount your substrates. | ||
When un-mounting someone's sample, please place them in a single carrier box, with your initials in parentheses, and write - out of E-beam - date - cassette and slot. | When un-mounting someone's sample, please place them in a single carrier box, with your initials in parentheses, and write - out of E-beam - date - cassette and slot. | ||
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The computer controlling the e-beam (EWS/9500 New) is located in the controller room which is a class 100 cleanroom area. The computers supporting the conversion of the e-beam files are also located in the controller room. | The computer controlling the e-beam (EWS/9500 New) is located in the controller room which is a class 100 cleanroom area. The computers supporting the conversion of the e-beam files are also located in the controller room. | ||
There are | ==Manuals== | ||
There are 4 manuals for the e-beam writer; apart from the main manual (this manual) there is a sdf and jdf-file manual, a BEAMER manual and a 2D mark detection manual. They can all be accessed from LabManager under Technical documents. | |||
The original JEOL manual for the e-beam writer FS9500 is located on the O-drive: O:\CleanroomDrive\_Equipment\E-beam | The original JEOL manual for the e-beam writer FS9500 is located on the O-drive: O:\CleanroomDrive\_Equipment\E-beam | ||
Technical Specification | |||
==Technical Specification== | |||
The system can be characterized as follows: | The system can be characterized as follows: | ||
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*Electron-beam scanning speeds, f, up to 100 MHz are available (which is maximum scan speed). | *Electron-beam scanning speeds, f, up to 100 MHz are available (which is maximum scan speed). | ||
*The acceleration voltage is 100 kV. | *The acceleration voltage is 100 kV. | ||
*The e-beam writer can pattern structures with a minimum resolution of | *The e-beam writer can pattern structures with a minimum reproducible resolution of 7 nm, depending on the resist type. | ||
*The maximum field-size without stitching is 1000µm x 1000µm. | *The maximum field-size without stitching is 1000µm x 1000µm, but can be smaller if needed. | ||
*The machine has cassettes that can contain either 6 wafers of 2” in size, 2 or 3 wafers of 4” in size, 1 wafer of 6” in size, 1 wafer of 8” in size, 4 chips of different sizes(slot sizes 4 mm, 8 mm, 12 mm, and 20 mm) | *The machine has cassettes that can contain either 6 wafers of 2” in size, 2 or 3 wafers of 4” in size, 1 wafer of 6” in size, 1 wafer of 8” in size, 4 chips of different sizes(slot sizes 4 mm, 8 mm, 12 mm, and 20 mm) | ||
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== Rough estimation of exposure time == | == Rough estimation of exposure time == | ||
[[ | [[Image:old_and_new_column_beam_size_in_one_page_March172019.jpg|400px|right|]] | ||
Based on the equations above, a rough estimate of the exposure time is easily calcualted. In the second sheet of the e-beam logbook, a simple program for calculating the scan speed frequency and an estimation of the exposure time can be found. Note, that the actual writing time will exceed the exposure-time, as the exposure-time calculation doesn’t include pre-calibrations and stage movement during exposure. | Based on the equations above, a rough estimate of the exposure time is easily calcualted. In the second sheet of the e-beam logbook, a simple program for calculating the scan speed frequency and an estimation of the exposure time can be found. Note, that the actual writing time will exceed the exposure-time, as the exposure-time calculation doesn’t include pre-calibrations and stage movement during exposure. | ||