Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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'''Feedback to this page''': '''[mailto:e-beam@ | '''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' | ||
= | = File preparation for exposure on JEOL 9500 = | ||
[[Image:Conversion.png|600px|right|]] | |||
For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job. | |||
== Conversion from GDS to V30 in Beamer == | |||
Beamer has a lot of different modules and can be used to manipulate a design considerably. In this section we will only look at how to import a design file and export it to V30. | |||
Beamer uses a node based workflow and each task is defined by a node with its own set of parameter. For this simple example we will only use the "Import" and "Export" nodes. | |||
== Basic SDF conten == | |||
== Basic JDF content == | |||
If the layout is asymmetric, the conversion might result in an offset of the final layout onto the wafer. It is therefore recommended to symmetrise the layout, e.g. by inserting small structures in the corners of a rectangle that covers the layout. | If the layout is asymmetric, the conversion might result in an offset of the final layout onto the wafer. It is therefore recommended to symmetrise the layout, e.g. by inserting small structures in the corners of a rectangle that covers the layout. | ||
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DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | ||
CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | ||
</pre> | |||
The full list of calibration [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist|paths are available here.]] | |||
== Alignment and global mark detection == | == Alignment and global mark detection == | ||
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HSWITCH: | '''HSWITCH''': | ||
HSWITCH ON,OFF: machine focusses beam to the Height average between P and Q marks | HSWITCH ON,OFF: machine focusses beam to the Height average between '''P and Q marks''' | ||
HSWITCH OFF,ON: machine focusses beam to the height average of chip marks | HSWITCH OFF,ON: machine focusses beam to the height average of '''chip marks''' | ||
HSWITCH ON,ON: machine focusses beam to the height average of chip marks. The chip mark height will overrule the P and Q mark height during exposure. | HSWITCH ON,ON: machine focusses beam to the height average of chip marks. The chip mark height will overrule the P and Q mark height during exposure. | ||
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CHIPAL V1/V4: | CHIPAL V1/V4: | ||
The virtual CHIPAL command in the sdf-file, CHIPAL V1 or CHIPAL V4, can be used to measure the height of the substrate at well-defined positions on the substrate, thus correcting for height variations before pattern writing. To use this, HSWITCH should be set to 'HSWITCH OFF,ON' or 'HSWITCH | The virtual CHIPAL command in the sdf-file, CHIPAL V1 or CHIPAL V4, can be used to measure the height of the substrate at well-defined positions on the substrate, thus correcting for height variations before pattern writing. To use this, HSWITCH should be set to 'HSWITCH OFF,ON' or 'HSWITCH ON,ON'. | ||
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[[File:markorientation.jpg|300px]] | [[File:markorientation.jpg|300px]] | ||
note 2: Always add | note 2: Always add 5% to the current in this command to make sure you work well below 200 MHz and thus will not be affected if the current fluctuates above the base current. | ||
== Dose variation == | == Dose variation == | ||
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# The order of commands might be wrong in either the sdf- or jdf-file; check the order of commands in the templates in the directory home/eb0/jeoleb/job/templates | # The order of commands might be wrong in either the sdf- or jdf-file; check the order of commands in the templates in the directory home/eb0/jeoleb/job/templates | ||
# The sdf- or jdf-files might have been opened in a text-program different from SuperEdi, e.g. notepad; this can corrupt the files and add linefeeds or tokens at line-ends. This can be checked in SuperEdi. In most cases, the problem can be solved by opening the sdf- and jdf-file in SuperEdi and save it again while setting the line endings to UNIX. | # The sdf- or jdf-files might have been opened in a text-program different from SuperEdi, e.g. notepad; this can corrupt the files and add linefeeds or tokens at line-ends. This can be checked in SuperEdi. In most cases, the problem can be solved by opening the sdf- and jdf-file in SuperEdi and save it again while setting the line endings to UNIX. | ||
# If none of the above works find a template home/eb0/jeoleb/job/templates and re-write your information into it, do NOT copy for the reasons of the last point above. | |||
# The path writing requires a scan speed larger than 100MHz; increase the shot pitch (SHOT) in the sdf-file and compile again. | # The path writing requires a scan speed larger than 100MHz; increase the shot pitch (SHOT) in the sdf-file and compile again. | ||