Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI: Difference between revisions
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<!-- Page reviewed 9/8-2022 jmli --> | |||
{{Author-jmli1}} | |||
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | ||
|+ '''Process runs''' | |+ '''Process runs''' | ||
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| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean | | 10 minute TDESC clean | ||
| | | nanolab/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins | ||
| S004745 | | S004745 | ||
! New showerhead | ! New showerhead | ||
Latest revision as of 11:26, 28 April 2023
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 15/12-2014 | 4" Wafer with travka65 mask | AZ standard | Si / 65 % | Pegasus/jmli | 10 minute TDESC clean | nanolab/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins | S004745 | New showerhead |
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