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| '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Aluminum_Oxide click here]''' | | '''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' |
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| | '''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.''' |
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| =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Aluminum_Oxide click here]''' |
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| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
| | Etching Al<sub>2</sub>O<sub>3</sub> can be done both chemically (wet) and by dry etching. |
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| | Chemical etching can be done using BHF (60nm/min) or a developer (4nm/min). This will be selective to most materials not containing Al. |
| | We have done some test of Al<sub>2</sub>O<sub>3</sub> in dry etching. It has been mostly tested in the III-V ICP and ICP Metal. Please see links below. |
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| ![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Method 1]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Method 2]]
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| | *[[/Al2O3 Etch with ICP Metal|Al<sub>2</sub>O<sub>3</sub> etch using ICP metal]] |
| |-style="background:WhiteSmoke; color:black"
| | *[[/Al2O3 Etch with III-V ICP|Al<sub>2</sub>O<sub>3</sub> etch using III-V ICP]] |
| !Generel description
| | *[[/Al2O3 Etch using HF|Al<sub>2</sub>O<sub>3</sub> etch using HF]] |
| |Generel description - method 1
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| |Generel description - method 2
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| |-style="background:LightGrey; color:black"
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| !Parameter 1
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| *A | |
| *B
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| *A
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| *B
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| |-style="background:WhiteSmoke; color:black"
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| !Parameter 2
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| *A
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| *B
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| *C
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| *A
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| |-style="background:LightGrey; color:black"
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| !Substrate size
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| *<nowiki>#</nowiki> small samples
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| *<nowiki>#</nowiki> 50 mm wafers
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| *<nowiki>#</nowiki> 100 mm wafers | |
| *<nowiki>#</nowiki> 150 mm wafers
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| *<nowiki>#</nowiki> small samples
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| *<nowiki>#</nowiki> 50 mm wafers
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| *<nowiki>#</nowiki> 100 mm wafers
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| *<nowiki>#</nowiki> 150 mm wafers
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| |-style="background:WhiteSmoke; color:black"
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| !'''Allowed materials'''
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| *Allowed material 1
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| *Allowed material 2
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| *Allowed material 1
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| *Allowed material 2
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| *Allowed material 3
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| <br clear="all" /> | |
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| *[[/Al2O3 Etch with ICP Metal|Al2O3 etch using ICP metal]]
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| *[[/Al2O3 Etch with III-V ICP|Al2O3 etch using III-V ICP]] | |
