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==Probe Station==
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe Station click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]'''
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=Probe Station=
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]]


The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.


The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.  
Samples can be inspected by either a microscope and/or a camera.


The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.
Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom D-3]]


'''The user manual, technical information and contact information can be found in LabManager:'''


'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=163 Four point probe]'''
The user manual, technical information and contact information can be found in
[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 '''Labmanager]'''.
 
 
==Performance and Process Parameters==
 
{| border="2" cellspacing="2" cellpadding="3"
 
|-
!style="background:silver; color:black;" align="center"|
Purpose
|style="background:LightGrey; color:black"|
Electrical measurements
|style="background:WhiteSmoke; color:black"|
*I/V
*Resistance
*Data collection by PC possible
|-
!style="background:silver; color:black" align="center"|
Performance
|style="background:LightGrey; color:black"|
Pad size
|style="background:WhiteSmoke; color:black"|
*100x100µm or more
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|
Substrates
|style="background:LightGrey; color:black"|
Batch size
|style="background:WhiteSmoke; color:black"|
*One sample
|-
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*No restrictions
|-
|}

Latest revision as of 18:47, 27 May 2025

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

Probe Station

Probe station. Positioned in serviceroom CX1

The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.

Samples can be inspected by either a microscope and/or a camera.

Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.


The user manual, technical information and contact information can be found in Labmanager.


Performance and Process Parameters

Purpose

Electrical measurements

  • I/V
  • Resistance
  • Data collection by PC possible

Performance

Pad size

  • 100x100µm or more

Substrates

Batch size

  • One sample
Substrate materials allowed
  • No restrictions