Specific Process Knowledge/Characterization/Optical characterization/advanced ellipsometry: Difference between revisions
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== Examples of advanced use of the ellipsometer== | == Examples of advanced use of the ellipsometer== | ||
===Dielectric function measurement of emerging semiconductors by Andrea Crovetto=== | ===Dielectric function measurement of emerging semiconductors by Andrea Crovetto@Nanotech 2016=== | ||
[[Media:2016_11_ancro_ellipsometry_at_Danchip.pdf]] <br> | [[Media:2016_11_ancro_ellipsometry_at_Danchip.pdf]] <br> | ||
Content: | Content: | ||
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*Phase analysis of ”non-ideal” thin films | *Phase analysis of ”non-ideal” thin films | ||
*Thickness mapping (for its own sake and for resistivity mapping) | *Thickness mapping (for its own sake and for resistivity mapping) | ||
*All-optical determination of electrical properties of transparent conductive materials | *All-optical determination of electrical properties of transparent conductive materials. | ||
Latest revision as of 14:11, 18 August 2021
Examples of advanced use of the ellipsometer
Dielectric function measurement of emerging semiconductors by Andrea Crovetto@Nanotech 2016
Media:2016_11_ancro_ellipsometry_at_Danchip.pdf
Content:
- Dielectric function determination of new thin-film semiconductors
- Learning about their electronic properties
- Phase analysis of ”non-ideal” thin films
- Thickness mapping (for its own sake and for resistivity mapping)
- All-optical determination of electrical properties of transparent conductive materials.