Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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mrEBL6000 works as a negative e-beam resist but is also UV sensitive, why resist and coated wafers should be kept in yellow rooms only. When carrying the wafers to the e-beam writer, use a black or blue box for protection. While mounting the wafers in the e-beam cassettes, you can turn off the white light in the e-beam room and turn on the yellow light which is located above the pre-aligner setup. Please mount as close to exposure as possible and turn of the with light outside the room and place a note on the door not to turn on light while the cassette is in the stocker. | |||
mrEBL6000 is a chemically amplified resist, i.e. immediately after e-beam exposure, the wafers require a post-exposure bake. If no post-exposure bake is performed, the resist is not crosslinked and will most likely dissolve during development. | |||
This resist can be used as standard negative resist at Nanolab, but due to limited use, we often need to buy a new bottle, hence please ask long time (up to 3 months) in advance for this chemical. or by it yourself! | |||
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== 3 week project on mrEBL6000 by William Tiddi == | == 3 week project on mrEBL6000 by William Tiddi == | ||
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==Contrast Curve== | ==Contrast Curve== | ||
The contrast curve is measured on lines 100 nm in width, exposed with doses in the range of 6-63 µC/cm2. After exposure, the sample has been post-exposure baked 5 min @ 110 degree C. Development is performed with mr-DEV 600 in 40s followed by an IPA rinse 60s. | |||
These measurements are performed by WILTID April 2015. | |||
[[File:mrEBL_contrast.png|right|500px]] | |||
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[[File: | [[File:mrEBL_doses6_33.png|left|600px]] | ||
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