Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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== Selecting high resolution spectra for peak fitting == | == Selecting high resolution spectra for peak fitting == | ||
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[[File:XPS-basics19b.jpg|300px]] | [[File:XPS-basics19b.jpg|300px]] | ||
Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'. | Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'. | ||
[[File:Si2p fit1.jpg|500px]] | [[File:Si2p fit1.jpg|500px]] | ||
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The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | ||
The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|here]]</span>. | The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|'''here''']]</span>. | ||