Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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== Selecting high resolution spectra for peak fitting == | == Selecting high resolution spectra for peak fitting == | ||
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# Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | # Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | ||
# Select 'All Columns' and 'Constraints and Values' | # Select 'All Columns' and 'Constraints and Values' | ||
[[File:XPS-basics19a1.jpg|500px]] | [[File:XPS-basics19a1.jpg|500px]] | ||
[[File:XPS-basics19b.jpg|300px]] | [[File:XPS-basics19b.jpg|300px]] | ||
Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'. | |||
[[File:Si2p fit1.jpg|500px]] | |||
Then, | |||
# Click the 'Peak Fitting' button, select 'Fit All Levels' in the 'Fit Peaks'. | |||
# Click 'Accept' when the fitting routine has completed. | |||
The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | ||
The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|here]]</span>. | The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|'''here''']]</span>. | ||