Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]''' | |||
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This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration. | |||
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==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>== | ==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>== | ||
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Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C) | Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C) | ||
This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] | This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires login] (Phys. Rev. Lett. 115(17) 2015, 177402) | ||
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<gallery caption="" widths=" | <gallery caption="" widths="400px" heights="350px" perrow="2"> | ||
image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | ||
image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | ||
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<b>Evgeniy Shkondin, DTU | <b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b> | ||
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Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C) | Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C) | ||
This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] | This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires longin] (Phys. Rev. Lett. 115(17) 2015, 177402) | ||
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<gallery caption="" widths=" | <gallery caption="" widths="400px" heights="350px" perrow="2"> | ||
image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | ||
image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | ||
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<b>Evgeniy Shkondin, DTU | <b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b> | ||
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<b>Temperature: 120 <sup>o</sup>C</b> | <b>Temperature: 120 <sup>o</sup>C</b> | ||
All four recipes is based on <b>Al2O3_LT</b> amd <b>TiO2_LT</b> above mentioned low temperature recipes. | All four recipes is based on <b>Al2O3_LT</b> amd <b>TiO2_LT</b> above mentioned low temperature recipes. Optical research based on fabricated Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> multilayers has been published [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] (Phys. Rev. Lett. 115(17) 2015, 177402) | ||
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image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers. | image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers. | ||
</gallery> | </gallery> | ||
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | <b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b> | ||
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===Investigation of chemical composition in multilayers system=== | ===Investigation of chemical composition in multilayers system=== | ||
Chemical | Chemical tace analysis has been performed using [[Specific_Process_Knowledge/Characterization/XPS/K-Alpha|XPS K-Alpha]] equipment in depth profile mode. | ||
<gallery caption="" widths="1000px" heights="1000px" perrow="1"> | <gallery caption="" widths="1000px" heights="1000px" perrow="1"> | ||
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<gallery caption="" widths=" | <gallery caption="" widths="400px" heights="350px" perrow="2"> | ||
image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers. | image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers. | ||
image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal multilayers. | image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal multilayers. | ||
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | <b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b> | ||
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | <b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b> | ||
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