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This page describes non standart recipes including multilayers structures.
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]''' 
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This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.
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==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==
==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==


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Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)
Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)


 
This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires login] (Phys. Rev. Lett. 115(17) 2015, 177402)




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|-  
|-  
|250  
|250  
|19.58
|24.83
|2.23
|1.22
|0.35
|0.16
|1.66
|1.61


|-  
|-  
|500  
|500  
|37.94
|45.48
|2.09
|1.35
|0.60
|0.41
|1.65
|1.63


|-  
|-  
|750  
|750  
|56.52
|68.03
|1.85
|1.42
|0.81
|0.59
|1.65
|1.63


|-  
|-  
|1000  
|1000  
|75.91
|90.66
|1.49
|1.74
|0.59
|0.94
|1.65
|1.63


|-
|-
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%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%
 
 
The uniformity, thickness, refractive index has been obtained using [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellipsometer VASE]].
 
 
<gallery caption="" widths="400px" heights="350px" perrow="2">
image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
</gallery>
 
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<b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b>
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==Low temperature deposition of TiO<sub>2</sub>==
==Low temperature deposition of TiO<sub>2</sub>==
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Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)
Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)
This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires longin] (Phys. Rev. Lett. 115(17) 2015, 177402)
{| border="2" cellspacing="2" cellpadding="3" colspan="10"
|bgcolor="#98FB98" |'''TiO<sub>2</sub> deposition at 120 <sup>o</sup>C'''
|-
|
{| {{table}}
| align="center" |
{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for TiO2 LT recipe
|-
!Number of cycles
|<b>Thickness (nm)</b>
|<b>Uniformity across 100mm Si substrate (%)</b>
|<b>Standard deviation error</b>
|<b>Refractive index @ 632.8 nm</b>
|-
|250
|10.17
|2.19
|0.14
|2.18
|-
|500
|23.12
|1.80
|0.23
|2.40
|-
|750
|34.13
|1.87
|0.39
|2.39
|-
|1000
|46.13
|1.78
|0.50
|2.39
|-
|}
|-
|}
|}
%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%
The uniformity, thickness, refractive index has been obtained using [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellipsometer VASE]].
<gallery caption="" widths="400px" heights="350px" perrow="2">
image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
</gallery>
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<b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b>
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==Low temperature grown multilayers on flat surfaces==
==Low temperature grown multilayers on flat surfaces==


Recipe: EMA01
<b>Recipe: EMA01</b>


Recipe: EMA02
<b>Recipe: EMA02</b>


Recipe: EMA03
<b>Recipe: EMA03</b>


Recipe: EMA04
<b>Recipe: EMA04</b>


Temperature: 120 <sup>o</sup>C
<b>Temperature: 120 <sup>o</sup>C</b>
 
All four recipes is based on <b>Al2O3_LT</b> amd <b>TiO2_LT</b> above mentioned low temperature recipes. Optical research based on fabricated Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> multilayers has been published [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] (Phys. Rev. Lett. 115(17) 2015, 177402)
 
 
<gallery caption="" widths="1000px" heights="700px" perrow="1">
image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers.
</gallery>
 
<br clear="all" />
<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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===Investigation of chemical composition in multilayers system===
 
Chemical tace analysis has been performed using [[Specific_Process_Knowledge/Characterization/XPS/K-Alpha|XPS K-Alpha]] equipment in depth profile mode.
 
<gallery caption="" widths="1000px" heights="1000px" perrow="1">
image:XPS_depth_multi_survey.JPG| Survey scan.
</gallery>
 
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<gallery caption="" widths="400px" heights="350px" perrow="2">
image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers.
image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal  multilayers.
image:XPS_depth_Al_10_O.jpg| O 1s signal  multilayers.
image:XPS_depth_Al_10_Si.jpg| Si 2p signal  multilayers.
</gallery>
 
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<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures==
==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures==
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<gallery caption="" widths="500px" heights="500px" perrow="2">
<gallery caption="" widths="1000px" heights="1000px" perrow="1">
image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.
image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.


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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>
<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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