Specific Process Knowledge/Characterization/SEM Supra 1

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The SEM Supra 1 located in basement 346-907.Photo: DTU Nanolab internal

SEM Supra 1

The SEM Supra 1 is a scanning electron microscope (SEM). It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field, and minimal specimen preparation is required.

This SEM is equipped two secondary electron (SE) detectors: An SE2 detector located on one side inside the chamber and an Inlens detector located inside the column. The SEM also has a backscatter electron detector: A BSD detector

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber and using a dedicated VPSE (Variable Pressure Secondary Electron) detector it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the SE2 and InLens detectors will no longer work.

The SEM is the training for fabrication SEM at DTU Nanolab. It means that all new SEM users with no or little SEM experience must be trained on this tool and gain basic knowledge here before being qualified for training on other SEM's.

The SEM Supra 1 was installed in the cleanroom in November 2010, but it has now been relocated in the basement outside the cleanroom, so that users can avoid to clean samples that have been outside the cleanroom before SEM inspection.

The Sputter Coater 03 is located in the same room as the SEM Supra 1 and can be used to cover non-conductive samples (for instance glass or polymer samples) with a thin gold layer before SEM inspection to avoid charging problems.

Only users with samples that are somehow related to the work taking place in building 346 and 347 (the characterization part of DTU Nanolab). Other users will have to use the SEMs in building 314 (the characterization part of DTU Nanolab).

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 1 info page in LabManager,

Performance information

• SEM comparison page

Equipment performance

Equipment		SEM Supra 1 (Supra 40VP SEM)
Purpose	Imaging and measurement of	Conducting samples Semi-conducting samples Thin (~ 5 µm <) layers of non-conducting materials such as polymers Thick polymers, glass or quartz samples
Location		Basement of building 346
Performance	Resolution	1-2 nm (limited by vibrations) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (Se2) Inlens secondary electron (Inlens) 4 Quadrant Backscatter electron (QBSD) Variable pressure secondary electron (VPSE)
	Stage	X, Y: 130 × 130 mm T: -4 to 70o R: 360o Z: 50 mm
	Electron source	FEG (Field Emission Gun) source
	Operating pressures	Fixed at High vacuum (2 × 10-4mbar - 10-6mbar) Variable at Low vacuum (0.1 mbar - 2 mbar)
	Options	All software options available
Substrates	Batch size	Up to 6" wafer with full view
	Allowed materials	Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool

Quality control of length measurement

Quality Control (QC) for SEM Supra 1

QC procedure for SEM Supra 1 Newest QC data for SEM Supra 1 QC limits: Detector Settings Magnification Measured dimensions Calibration limit Action limit SE2 EHT 10 kV, WD 10 mm 2.500 k 70x70 μm ± 2 % ± 3 % SE2 EHT 10 kV, WD 10 mm 17.000 k 10x10 μm ± 2 % ± 3 % SE2 EHT 5 kV, WD 5 mm 17.000 k 10x10 μm ± 2 % ± 3 % VPSE EHT 10 kV, WD 10 mm, 17 Pa 17.000 k 10x10 μm ± 2 % ± 3 % InLens EHT 5 kV, WD 5 mm 200.000 k 1x1 μm ± 2 % ± 3 % InLens EHT 10 kV, WD 3 mm 1.000.000 k (imaging only) NA NA