Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions

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+{{cc-nanolab}}
-'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_LEO0 click here]'''
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_LEO0 click here]'''
+<br>
+<br>
+'''<p style="color:red;">The SEM LEO  has been decomissioned and relocated to DTU Mechanics in 2020.</p>'''
 =SEM LEO=
+[[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO located in cleanroom F-2]]
-[[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO]]
+The SEM LEO was a very reliable and rugged instrument that provided high quality SEM  images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM.
-The SEM LEO is a scanning electron microscope. It is a very reliable and rugged instrument that provides high quality SEM  images of most samples, and it has excellently served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM.
+In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography.
-However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so system so general imaging of user samples is no longer allowed.
+===Typical current values for EBL===
+Reported values are the average of five measurements from Elphy Quantum using the EBL holder's Faraday cup. All values in pA.
-The SEM LEO is located in the cleanroom. It was installed in 1998, and the software was ungraded in 2012.
+{| border="1" style="text-align: center; width: 320px; height: 200px;"
+|-
+|colspan="6" style="text-align: center;" style="background: #efefef;" | '''LEO - Current measurements 11/02/2017'''
-'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''
+|-
+!scope="row" |&nbsp;
+!|5kV
+!|10kV
+!|15kV
+!|20kV
-[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=37 SEM LEO info page in LabManager],
+|-
-== Performance information ==
+|-
+!10um
-*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]
+|13
+|17
-*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]]
+|20.5
+|25
+|-
+|-
+!20um
+|62
+|87
+|105
+|127
+|-
+|-
+!30um
+|160
+|175
+|215
+|264
+|-
+!60um
+|510
+|680
+|850
+|1040
+|}
-==Equipment performance and process related parameters==
+==Equipment performance==
 {| border="2" cellspacing="0" cellpadding="2"
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 |style="background:LightGrey; color:black"|Imaging and measurement of
 |style="background:WhiteSmoke; color:black"|
-*Any (semi)conducting sample that may have thin (> ~ 5 µm) layers of non-conducting materials on top
+* Conducting samples
+* Semi-conducting samples
+* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
 |-
 |style="background:LightGrey; color:black"|Other purpose
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 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
-*Cleanroom of DTU Danchip
+*Cleanroom of DTU Nanolab
 |-
 !style="background:silver; color:black;" align="center" width="60"|Performance