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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_3  click here]'''


''This page is written by DTU Nanolab  internal''


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_3  click here]'''
[[image:LA_SEM_Supra_3.jpg|400x400px|right|thumb|The SEM Supra 3 located in cleanroom C-1]]


=SEM Supra 3=
The SEM Supra 3 is a scanning electron microscope (SEM). It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field, and minimal specimen preparation is required.


[[image:LA_SEM_Supra_3.jpg|400x400px|right|thumb|The SEM Supra 3]]
This SEM is equipped two secondary electron (SE) detectors: An SE2 detector located on one side inside the chamber and an Inlens detector located inside the column.  


=SEM Supra 3=
The SEM also has an a HDAsB (High Definition four quadrant Angular Selective Backscattered electron) detector. This detector is sitting at the end of the column where the final cap is placed in the other SEMs. To avoid collision between the HDAsB detector and samples/sample holders, a set of rules have been introduced on the SEM Supra 3 that most importantly implies that the sample holder and the sample dimensions have to be noted in the software.


The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber and using a dedicated VPSE (Variable Pressure Secondary Electron) detector it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the SE2 and InLens detectors will no longer work.


The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the HV detectors will no longer work.
The SEM Supra 3 is located in the cleanroom. It was installed in September 2015.


The SEM is the training SEM at DTU Danchip. It means that all new SEM users with no and little SEM experience much be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.


The SEM Supra 1 (formerly known as SEM Zeiss) has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.


The SEM is located in basement outside the cleanroom. The Balzer Sputter is located in the same room and can be used to cover samples (for instance polymer samples from  the Polymer Injection Molding tool) with a thin gold layer before SEM inspection.
'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''


The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012.
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=361 SEM Supra 3 info page in LabManager],




'''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''
== Performance information ==


[http://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 SEM Supra 1 info page in LabManager],
*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]




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|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Any sample except bulk insulators such as polymers, glass or quartz wafers
* Conducting samples
* Semi-conducting samples
* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
* Thick polymers, glass or quartz samples
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Location  
!style="background:silver; color:black;" align="center" width="60"|Location  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Cleanroom of DTU Danchip
*Cleanroom of DTU Nanolab
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
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|style="background:LightGrey; color:black"|Detectors
|style="background:LightGrey; color:black"|Detectors
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Secondary electron (Se2)
*Secondary electron (SE2)
*Inlens secondary electron (Inlens)
*Inlens secondary electron (Inlens)
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
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|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Up to 6" wafer with full view
*Up to 4" wafer with full view
*Up to 6" wafer with full view, requires rotation of the wafer
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
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*Any standard cleanroom material
*Any standard cleanroom material
|-  
|-  
|}
==Quality control of length measurement ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 3'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=4745&mach=361 QC procedure for SEM Supra 3]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=361 Newest QC data for SEM Supra 3]<br>
'''QC limits:'''
{| {{table}}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
! Detector
! Settings
! Magnification
! Measured dimensions
! Calibration limit
! Action limit
|-
|SE2
| EHT 10 kV,
WD 10 mm
| 2.440 k
(mag range 1)
| 70x70 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 10 kV,
WD 10 mm
| 17.000 k
(mag range 2)
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 5 kV,
WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|InLens
| EHT 2 kV,
WD minimum
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|HDAsB (Compo)
| EHT 10 kV,
WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| VPSE
| EHT 10 kV,
WD 10 mm,
17 Pa
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 5 kV,
WD 5 mm
| 200.000 k
(mag range 3)
| 1x1 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 10 kV,
WD 3 mm
| 1.000.000 k
| (imaging only)
| NA
| NA
|-
|}
|-
|}
|}
|}
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