Specific Process Knowledge/Pattern Design/Travka: Difference between revisions

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== The Travka mask set ==
== The Travka mask set ==



Latest revision as of 09:33, 28 June 2023

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The Travka mask set

The travka mask set consists of 7 masks:

The numbers in the end of the mask names refer to the average exposed area of a positive photolithography process. The masks are designed for characterisation of dry etches and holds a number of 1x1 or 1x2 cm fields. The positions of these fields are the same on all masks.

Each field has a number of features (for instance trenches of variable widths) distributed in such a way that the exposed area within the field corresponds to value for each mask.

Below is shown the field distribution on a 4 inch wafer. Click on the links in the figure to find more information on the individual fields.

Overview of the travka mask set: The position of the fields in relation to the 4" wafer periphery.
Field distribution
Dummy Dummy A-circle PilCav Dektak PilCav A-circle Dummy Dummy
Dummy PilCav A-square Filmtek ASE Filmtek A-square Deskew Dummy
T-ridge A-line Dektak T-ridge A-line
Filmtek PilCav A-circle Filmtek ASE Filmtek A-circle PilCav Filmtek
Dektak ASE Dektak ASE Dektak ASE Dektak ASE Dektak
Filmtek PilCav A-circle Filmtek ASE Filmtek A-circle PilCav Filmtek
A-line T-ridge Dektak A-line T-ridge
Dummy Deskew A-square Filmtek ASE Filmtek A-square PilCav Dummy
Dummy Dummy A-circle PilCav Dektak PilCav A-circle Dummy Dummy