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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Profiler/Optical_Profiler_(Sensofar)_acceptance_test click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Profiler/Optical_Profiler_(Sensofar)_acceptance_test click here]'''  


=<span style="color:#FF0000"> This optical profiler has been decommissioned and replaced by the S Neox system, which is very similar </span> =


=Results from the Optical Profiler (Sensofar) acceptance test=
=Results from the Optical Profiler (Sensofar) acceptance test=


The acceptance test was performed in January 2012 by ST Instruments and Sensofar together with  
The acceptance test was performed in January 2012 by ST Instruments and Sensofar together with  
Pernille V. Larsen@Danchip and Berit G. Herstrøm@Danchip.
Pernille V. Larsen@ DTU nanolab and Berit G. Herstrøm @ DTU nanolab.


==This Table shows an overview of the acceptance tests==
==This Table shows an overview of the acceptance tests==
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*Objective: Interferometric 50x DI
*Objective: Interferometric 50x DI
*Z scan: VSI
*Z scan: VSI
*Light souce: increased gain and contrast
*Light source: increased gain and contrast


==Results of acceptance test no. 4==
==Results of acceptance test no. 4==
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Measurement: Depth of pattern
Measurement: Depth of pattern


Standard profiler measurement:335nm
Standard profiler measurement:335 nm


Acceptance criteria:Depth within ±1% from a standard profiler measurement (331.65nm-338.35nm) and repeatability (3 successive measurements) within 0.1%  
Acceptance criteria:Depth within ±1% from a standard profiler measurement (331.65nm-338.35nm) and repeatability (3 successive measurements) within 0.1%  
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| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''Measured depth [nm]'''
| align="center" style="background:#f0f0f0;"|'''Measured depth [nm]'''
| align="center" style="background:#f0f0f0;"|'''Repeated 20170925 with cover off'''
| align="center" style="background:#f0f0f0;"|'''Repeated 20180816 after repair'''
|-
|-
| 1||337.5
| 1||337.5||347.9||341.1
|-
|-
| 2||336.5
| 2||336.5||333.9||340.4
|-
|-
| 3||334.7
| 3||334.7||341.5||337.2
|-
|-
| 4||335.5
| 4||335.5||343.2||330.8
|-
|-
| 5||339.2
| 5||339.2||347.7||339.0
|-
|-
| 6||337.2
| 6||337.2||345.4||340.0
|-
|-
| 7||334.2
| 7||334.2||341.8||338.8
|-
|-
| 8||335.5
| 8||335.5||337.9||339.8
|-
|-
| 9||341.1
| 9||341.1||342.1||334.6
|-
|-
| 10||344.4
| 10||344.4||335.9||336.4
|-
|-
|Average depth||336.58
|Average depth||337.58||341.73||337.82
|-
|-
|Repeatability||3% (the bad repeatability was accepted due to the high noise level in the room)
|Repeatability||3.0% (the bad repeatability was accepted due to the high noise level in the room)||4.1%||3.0%
|}
|}


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'''Settings:'''
'''Settings:'''
Two different setting were tried out, the second was the most succesful:
Two different setting were tried out, the second was the most successful:


Setting no. 1:
Setting no. 1:
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Acceptance criteria: Repeatability within 0.2%
Acceptance criteria: Repeatability within 0.2%


Note: Because the surface roughness of the sample was very low and the noise/vibration level too high we could not obtain the specified repeatibility.
Note: Because the surface roughness of the sample was very low and the noise/vibration level too high we could not obtain the specified repeatability.




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'''Result'''
'''Result'''
*The surface roughness (Ra) was 0.5nm
*The surface roughness (Ra) was 0.5nm
*The repeatebility over 10 measurements was 34%
*The repeatability over 10 measurements was 34%
*The maximum deviation in roughness was 0.2nm
*The maximum deviation in roughness was 0.2nm


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