Specific Process Knowledge/Back-end processing/Disco Saw: Difference between revisions

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==Disco Automatic dicing saw, model DAD321==
'''Feedback to this page''': '''[mailto:danchipsupport@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Back-end_processing/Disco_Saw click here]'''


[[Image:Disco_DAD_321_Dicer.jpg|300x300px|thumb|Dicer positioned on 1. floor bldg 346 room|right]]
==Disco Automatic dicing saw, model DAD321 (old) and DAD3241 (new 2021)==
The dicers feature versatile processing capabilities, compact designs, and high precision and reliability. Users perform workpiece loading, alignment, and unloading manually.


The dicers at DTU Nanolab is placed in room 157 on the first floor in bldg. 346. Please notice that this is not a cleanroom and that the dicing process is very dirty.
<!--
[[Image:Disco_DAD_321_Dicer.jpg|thumb|Dicer positioned on 1. floor bldg 346 room 157]]
[[Image:DAD_3241_picture.jpg|thumb|Dicer positioned on 1. floor bldg 346 room 157]]
-->


The dicer feature versatile processing capabilities, compact designs, and high precision and reliability. Users perform workpiece loading, alignment, and unloading manually.
In general it is ''not allowed'' to bring back your samples into the Cleanroom. You need approval from DTU Nanolab staff to do this. Your samples have to be thoroughly cleaned in the gowning area and get a Piranha cleaning. You will only be allowed to use a limited number of tools for the processing after dicing.  


The dicer at DANCHIP is placed in room ?? on the first floor in bldg. 346. Please notice that this is not a cleanroom and that the dicingproces is very dirty. Think about how to clean your samples if you want to bring them back in the cleanroom.
[[File:IMG_20230228_112922.jpg|thumb|800px|Dicers positioned on 1. floor bldg 346 room 157]]


Please consider your layout of dies on your wafer. The dicer can only cut straight lines across the wafer and you can not end a line in the middle of the wafer.
Please see the illustrations for a good and a bad design.


{| cellpadding="2" style="border: 2px solid darkgray;"
! width="300" |
! width="300" |
! width="300" |
|- align="center"
| '''GOOD design - simple''' ||  '''GOOD design - complex''' || <span style="color:red">'''BAD design'''</span>
|- border="1" align="center"
|[[Image:Good design 2.jpg|300x300px|Good design]] || [[Image:Good design 3.jpg|300x300px|Good design]] || [[Image:Bad design 1b.jpg|300x300px|BAD design]]
|
|- align="center"
| '''GOOD design - simple''' ||  '''GOOD design - complex''' || <span style="color:red">'''BAD design'''</span>
|-
| || drawings by Jesper Hanberg, DTU Nanolab ||
|}
== Process information ==
*'''The user manual, user APV, technical information and contact information can be found in LabManager:'''
<!-- remember to remove the type of documents that are not present -->
<!-- give the link to the equipment info page in LabManager: -->
**[http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=168 DAD 321 Saw in LabManager]
**[http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=489 DAD 3241 Saw in LabManager]
*[[Specific Process Knowledge/Back-end processing/Disco Saw#Comparing dicing parameters for different materials |Comparing dicing parameters for different materials]]
*[[Specific Process Knowledge/Back-end processing/Disco Saw#Images of diced samples |Images of diced samples]]
*Dicing work sheet: [[Media:Dicing Work Sheet v2.docx |Dicing Work Sheet v2.docx]] Fill out before requesting dicing.
===Overview of the performance Disco DAD 321 and DAD 3241 Dicer===


<br clear="all" />
[[Image:IMG 20230228 113020.jpg|thumb|Wafer mounter for DAD 3241]]
===A rough overview of the performance Disco DAD321 Dicer===


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"  
|-
|-
!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left" rowspan="2"|Machine
|style="background:LightGrey; color:black"|Equipment for dicing out samples.||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Name
|style="background:WhiteSmoke; color:black"|
DAD 321 (old)
|style="background:WhiteSmoke; color:black"|
DAD 3241 (new 2021)
|-
|style="background:LightGrey; color:black"|Operation
|style="background:WhiteSmoke; color:black"|
*Keyboard
*F-key menu driven
*BW screen
|style="background:WhiteSmoke; color:black"|
*Touch screen
*Guided menu
*Color screen
|-
!style="background:silver; color:black;" align="left" rowspan="2"|Purpose  
|style="background:LightGrey; color:black"|Main usage
|style="background:WhiteSmoke; color:black"|
Dicing Borofloat and Fused Silica wafers
|style="background:WhiteSmoke; color:black"|
Dicing Silicon wafers
|-
|style="background:LightGrey; color:black"|Wafer type
|style="background:WhiteSmoke; color:black"|
*'''Pyrex/Borofloat'''
*'''Fused Silica'''
*'''Silicon bonded to Pyrex/Borofloat'''
*'''Silicon bonded to Silicon'''
* Other materials - ask
*Pure Silicon samples
*Pure Silicon samples
|style="background:WhiteSmoke; color:black"|
*'''Pure Silicon samples'''
*Pyrex/Borofloat
*Silicon bonded to Silicon
*Silicon bonded to Silicon
*Silicon bonded to Pyrex/Borofloat
*Silicon bonded to Pyrex/Borofloat
*Pyrex/Borofloat
* Other materials - ask
|-
|-
!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
|style="background:LightGrey; color:black"|X-axis cutting range||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|X-axis cutting range
|style="background:WhiteSmoke; color:black"|
192 mm
192 mm
|style="background:WhiteSmoke; color:black"|
210 mm
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|X-axis cut speed
|style="background:WhiteSmoke; color:black"|
0.1 - 300 mm/sec
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
50 Å to 262 µm
0.1 - 800 mm/sec
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:LightGrey; color:black"|Y-axis cutting range
|style="background:WhiteSmoke; color:black"|
162 mm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
down to 0.067 µm
210 mm
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:LightGrey; color:black"|Y-axis index step
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
1Å, 10Å or 20Å
0.0002 mm
|style="background:WhiteSmoke; color:black"|
0.0001 mm
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:LightGrey; color:black"|Y-axis single error
|style="background:WhiteSmoke; color:black"|
0.003 or less
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
1.2(W[µm]-5µm)
0.002 or less
|-
|-
|-
|-
!style="background:silver; color:black" align="left"|Hardware settings
!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates
|style="background:LightGrey; color:black"|Tip radius
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
up to 6"
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
up to 8"
|-
|-
!style="background:silver; color:black" align="left"|Substrates
| style="background:LightGrey; color:black"|Layers that can't be diced
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Thick metal (>0.75 mm)
*III-V samples
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*up to 6"
*Thick metal (>0.75 mm)
*III-V samples
|-
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Accessories
| style="background:LightGrey; color:black"|Accessories for wafer handling
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*In principle all materials
*Manual wafer mounter for blue tape
|style="background:WhiteSmoke; color:black"|
*Manual wafer mounter for tape with backside foil (Powatec P200)
*Automatic Wafer cleaning station (Disco DCS 1441)
*UV curing station (Powatec U200)
|-  
|-  
|}
|}


[[Image:IMG 20230228 113101.jpg|thumb|600px|left|Wafer mounting table for DAD 321]]
[[Image:IMG 20230228 113035.jpg|thumb|600px|UV curing/Tape release]]
<br clear="all" />


===Comparing dicing parameters for different materials '''DAD 321'''===


<br clear="all" />
[[Image:IMG 20230228 113045.jpg|300px|thumb|Wafer cleaning station DCS 1441]]


==Comparing dicing parameters for different materials==
Do not mix blades for the DAD 321 with the blades for the DAD 3241. They have different outer diameters


{| border="2" cellspacing="0" cellpadding="4" align="center"
{| border="2" cellspacing="0" cellpadding="4"  
!
!
!Silicon
!Silicon
Line 73: Line 167:
|HUB Blade ZH05 (27HEEF)
|HUB Blade ZH05 (27HEEF)
|HUBless Blade B1A862
|HUBless Blade B1A862
|-valign="top"
|'''Blade width'''
|50 µm
|150 µm
|-valign="top"
|-valign="top"
|'''Cutlinewidth'''
|'''Cutlinewidth'''
|60 µm
|60 µm
|150 µm
|180 - 200 µm
|-valign="top"
|-valign="top"
|'''Recommended feed speed'''
|'''Recommended feed speed'''
|<250 µm (for silicon oxides > ~75nm)
|Up to 20 mm/sec
|20 Å to ~2µm (for silicon oxide)
|Up to 2 mm/sec (0.5 mm/sec)
|-valign="top"
|-valign="top"
|'''Recommended dice depth'''
|'''Recommended dice depth'''
|Very dependent of how good the model fits (if the fit is good it could be within 1% for a single layer)
|Set blade height to 200µm (preferred).<br>This leaves 125µm uncut since blue tape is 75µm.<br> It is possible to cut through the sample.
|Very dependent of how good the model fits.
|Do not cut deeper than 500 µm in each pass (for fused Silica and SiC 200 µm). <br>
If you have thicker wafers then use several passes decreasing the blade height for each pass.<br>
For 500 µm thick wafers set blade height to 200µm (preferred).<br>
This leaves 125µm uncut since blue tape is 75µm.<br>
It is possible to cut through the sample.
|-valign="top"
|-valign="top"
|'''Index range'''
|'''Max. sample thickness'''
|not any limits
|1.5 mm
|not any limits
|2.0 mm
|-
|}
 
===Comparing dicing parameters for different materials '''DAD 3241'''===
 
Do not mix blades for the DAD 321 with the blades for the DAD 3241. They have different outer diameters
 
{| border="2" cellspacing="0" cellpadding="4"
!
!Silicon
!Other materials
|- valign="top"
|'''Bladetype'''
|HUB Blade
|Ask! (HUBless)
|-valign="top"
|-valign="top"
|'''Index accuracy'''
|'''Blade width'''
|not known
|50 µm
|not known
|ask
|- valign="top"
|-valign="top"
|'''Wavelength range'''
|'''Cutlinewidth'''
|400-1000 nm
|50 µm
|300-950 nm
|ask
|-valign="top"
|'''Recommended feed speed'''
|Up to 40 mm/sec
|ask
|-valign="top"
|'''Recommended dice depth'''
|We usually cut all way through the wafer with a blade height of 50µm (preferred).<br>
|ask!
|-valign="top"
|-valign="top"
|'''What kind of thin films can be measured'''
|'''Max. sample thickness'''
|Any film that is transparent to the light in the given wavelength range
|1.5 mm
ex:
|2.0 mm
*Silicon Oxide
*Silicon nitride
*PolySilicon
*Photoresists
*SU8
*Other polymers
*Very thin layers of metals (<20 nm)
*and many more
|Any film that is transparent to the light in the given wavelength range
ex:
*Silicon Oxide
*Silicon nitride
*Very thin layers of PolySilicon
*Photoresists
*SU8
*Other polymers
*Very thin layers of metals (<20 nm)
*and many more
|-  
|-  
|}
|}


<!--
This is not a typical dice line!


[[Image:Dicetest_001.jpg|300x300px|thumb|test|left]]
===Images of diced samples===
[[Image:Dicetest_001.jpg|300x300px|thumb|Si V-groove diced with ZH05 blade |left]]
-->

Latest revision as of 12:05, 28 February 2023

Feedback to this page: click here

Disco Automatic dicing saw, model DAD321 (old) and DAD3241 (new 2021)

The dicers feature versatile processing capabilities, compact designs, and high precision and reliability. Users perform workpiece loading, alignment, and unloading manually.

The dicers at DTU Nanolab is placed in room 157 on the first floor in bldg. 346. Please notice that this is not a cleanroom and that the dicing process is very dirty.

In general it is not allowed to bring back your samples into the Cleanroom. You need approval from DTU Nanolab staff to do this. Your samples have to be thoroughly cleaned in the gowning area and get a Piranha cleaning. You will only be allowed to use a limited number of tools for the processing after dicing.

Dicers positioned on 1. floor bldg 346 room 157

Please consider your layout of dies on your wafer. The dicer can only cut straight lines across the wafer and you can not end a line in the middle of the wafer. Please see the illustrations for a good and a bad design.

GOOD design - simple GOOD design - complex BAD design
Good design Good design BAD design
GOOD design - simple GOOD design - complex BAD design
drawings by Jesper Hanberg, DTU Nanolab

Process information


Overview of the performance Disco DAD 321 and DAD 3241 Dicer

Wafer mounter for DAD 3241
Machine Name

DAD 321 (old)

DAD 3241 (new 2021)

Operation
  • Keyboard
  • F-key menu driven
  • BW screen
  • Touch screen
  • Guided menu
  • Color screen
Purpose Main usage

Dicing Borofloat and Fused Silica wafers

Dicing Silicon wafers

Wafer type
  • Pyrex/Borofloat
  • Fused Silica
  • Silicon bonded to Pyrex/Borofloat
  • Silicon bonded to Silicon
  • Other materials - ask
  • Pure Silicon samples
  • Pure Silicon samples
  • Pyrex/Borofloat
  • Silicon bonded to Silicon
  • Silicon bonded to Pyrex/Borofloat
  • Other materials - ask
Performance X-axis cutting range

192 mm

210 mm

X-axis cut speed

0.1 - 300 mm/sec

0.1 - 800 mm/sec

Y-axis cutting range

162 mm

210 mm

Y-axis index step

0.0002 mm

0.0001 mm

Y-axis single error

0.003 or less

0.002 or less

Substrates Substrate size

up to 6"

up to 8"

Layers that can't be diced
  • Thick metal (>0.75 mm)
  • III-V samples
  • Thick metal (>0.75 mm)
  • III-V samples
Accessories Accessories for wafer handling
  • Manual wafer mounter for blue tape
  • Manual wafer mounter for tape with backside foil (Powatec P200)
  • Automatic Wafer cleaning station (Disco DCS 1441)
  • UV curing station (Powatec U200)
Wafer mounting table for DAD 321
UV curing/Tape release


Comparing dicing parameters for different materials DAD 321

Wafer cleaning station DCS 1441

Do not mix blades for the DAD 321 with the blades for the DAD 3241. They have different outer diameters

Silicon Pyrex or bonded Si/Pyrex
Bladetype HUB Blade ZH05 (27HEEF) HUBless Blade B1A862
Blade width 50 µm 150 µm
Cutlinewidth 60 µm 180 - 200 µm
Recommended feed speed Up to 20 mm/sec Up to 2 mm/sec (0.5 mm/sec)
Recommended dice depth Set blade height to 200µm (preferred).
This leaves 125µm uncut since blue tape is 75µm.
It is possible to cut through the sample.
Do not cut deeper than 500 µm in each pass (for fused Silica and SiC 200 µm).

If you have thicker wafers then use several passes decreasing the blade height for each pass.
For 500 µm thick wafers set blade height to 200µm (preferred).
This leaves 125µm uncut since blue tape is 75µm.
It is possible to cut through the sample.

Max. sample thickness 1.5 mm 2.0 mm

Comparing dicing parameters for different materials DAD 3241

Do not mix blades for the DAD 321 with the blades for the DAD 3241. They have different outer diameters

Silicon Other materials
Bladetype HUB Blade Ask! (HUBless)
Blade width 50 µm ask
Cutlinewidth 50 µm ask
Recommended feed speed Up to 40 mm/sec ask
Recommended dice depth We usually cut all way through the wafer with a blade height of 50µm (preferred).
ask!
Max. sample thickness 1.5 mm 2.0 mm