Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test: Difference between revisions

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Multipurpose Anneal furnace acceptance test

The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.

At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times

For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.

Oxidation parameters

Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"

Oxidation time: 80 min

Temperature: 1050 ^oC (all temperature zones)

O₂ flow: 1 slm

The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.

Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.

Results

Oxide thickness

	Date	Wafer 4			Wafer 16			Wafer 28			Center point only
		Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]
Run 1	28-01-2015	109.7	1.0	1.7	107.7	0.9	1.1	106.5	0.8	1.2	107.0	2.1	1.9
Run 2	28-01-2015	107.3	1.7	2.4	105.0	1.4	1.7	107.3	0.7	0.9	105.7	1.0	0.9
Run 3	30-01-2015	103.6	0.8	1.1	102.6	0.6	1.2	102.2	0.6	1.1	102.9	1.0	1.0
Average		106.9	1.2	1.7	105.1	1.0	1.3	105.3	0.7	1.1	105.2	1.4	1.3

Run-to-run
Average oxide thickness [nm]	St. deviation	Non-uniformity [%]
105.2	2.1	2.0

Refractive index

	Date	Wafer 4			Wafer 16			Wafer 28			Center point only
		Average refractive index	St. deviation	Non-uniformity [%]	Average refractive index	St. deviation	Non-uniformity [%]	Average refractive index	St. deviation	Non-uniformity [%]	Average refractive index	St. deviation	Non-uniformity [%]
Run 1	28-01-2015	1.46	0.00	0.04	1.46	0.00	0.07	1.46	0.00	0.06	1.4609	0.0004	0.0230
Run 2	28-01-2015	1.46	0.00	0.09	1.46	0.00	0.17	1.44	0.01	0.69	1.4561	0.0094	05873
Run 3	30-01-2015	1.46	0.00	0.06	1.46	0.00	0.05	1.46	0.00	0.07	1.4602	0.0004	0.0291
Average		1.46	0.00	0.06	1.46	0.00	0.10	1.46	0.00	0.27	1.46	0.00	0.21

Run-to-run
Average refractive index	St. deviation	Non-uniformity [%]
1.4591	0.0026	0.1637

@@ Line 1: / Line 1: @@
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace:_Multipurpose_annealing/Acceptance_test  click here]'''
-The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.
+''This page is written by DTU Nanolab  internal''
-At the acceptance test a dry oxide layers was grown on a boat of 150 mm wafers. The oxide growth was repeated three times
+==Multipurpose Anneal furnace acceptance test==
-The oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.
+The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.
+At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times
+For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.
 ==Oxidation parameters==
@@ Line 12: / Line 17: @@
 '''Oxidation time''': 80 min
-'''Oxidation temperature''': 1050 <sup>o</sup>C (all temoperature zones)
+'''Temperature''': 1050 <sup>o</sup>C (all temperature zones)
 '''O<sub>2</sub> flow''': 1 slm
-The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.
+The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.
-Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points on each wafer using the M-2000V ellipsometer.
+Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.
 ==Results==